Silicon wafer and manufacturing method thereof

ABSTRACT

A method of manufacturing a silicon wafer provides a silicon wafer which can reduce the precipitation of oxygen to prevent a wafer deformation from being generated and can prevent a slip extension due to boat scratches and transfer scratches serving as a reason for a decrease in wafer strength, even when the wafer is provided to a rapid temperature-rising-and-falling thermal treatment process.

This application is a Divisional of U.S. patent application Ser. No.13/258,962 which is a National Stage of International Application No.PCT/JP2010/002117 filed Mar. 25, 2010, which claims priority to JapaneseApplication No. 2009-098262 filed Apr. 14, 2009, and JapaneseApplication Nos. 2009-075001, 2009-074837, 2009-074836 all filed Mar.25, 2009. The disclosures of U.S. patent application Ser. No. 13/258,962and PCT/JP2010/002117 are expressly incorporated by reference herein intheir entireties.

TECHNICAL FIELD

The present invention relates to a silicon wafer and a manufacturingmethod thereof, and more particularly, to a technique which can be verysuitably used to prevent generation of a deformation such as a warp of asilicon wafer, which is provided to a thermal treatment in which a highinternal stress is generated.

BACKGROUND ART

A thermal process of device processes includes a plural low-temperaturetreatments and plural high-temperature treatments. Accordingly, evenwhen an epitaxial wafer is used, oxygen precipitates are formed in asubstrate wafer. In the past, the oxygen precipitates were effective forcapturing (gettering) metal dopants which may be generated in theprocess and the formation of the oxygen precipitates was desired.

However, recent device manufacturing processes include a plurality ofrapid temperature-rising-and-falling thermal treatment processes andthus a stress load increases in thermal treatment in the device process.Particularly, with the increase in integration of devices, the rapidtemperature-rising-and-falling thermal treatment process tends to befurther shortened in time and the highest temperature in the rapidtemperature-rising-and-falling thermal treatment process tends to beraised. From the 45 nm node (hp 65), annealing processes called FLA(flash lamp annealing), LSA (Laser Spike Anneal), LTP (laser thermalprocess), and Spike-RTA (Rapid Thermal Annealing) may be used.

In the FLA process among these, a wafer is heated to an initialtemperature of 400° C. to 600° C., the entire surface of the wafer isirradiated with light of a short wavelength from an Xe lamp and the liketo rapidly heat only the outermost surface layer of the wafer equal toor higher than 1100° C. up to the vicinity of the melting point ofsilicon, and it is then rapidly cooled. The thermal treatment time is onthe order from μ (micro) seconds to milli seconds.

The techniques related to the FLA process are disclosed in PatentDocument 1 and Patent Document 2.

CITATION LIST Patent Document

Patent Document 1: Published Japanese Translation of PCT No. 2008-515200

Patent Document 2: Japanese Unexamined Patent Application, FirstPublication No. 2008-98640

DISCLOSURE OF INVENTION Technical Problem

In the FLA process, since a temperature difference of 100° C. is causedbetween the front surface and the back surface of a wafer, a stress muchgreater than that in the RTA process which has been previously performedmay be loaded. Specifically, a thermal stress greater than 20 MPa may bepartially generated.

In the rapid temperature-rising-and-falling thermal treatment processsuch as the FLA process, when oxygen precipitates are formed, the sizesof the precipitates are deviated and a slip is caused from the largeprecipitates. Due to this slip, there may be a problem in that a waferlocally warps. When the wafer warps, the misalignment with a basepattern is caused at the time of exposure in the device process, therebylowering the device yield. It is not possible to restore the shape ofthe wafer, which locally warps in this way, to the original shape.

On the other hand, in the device process, it is not possible tocompletely suppress boat scratches and transfer scratches. Thedislocation (slip) causing the deformation of a wafer is generated fromthe boat scratches and the transfer scratches. Such slip extension canbe suppressed when the oxygen concentration and boron concentration inthe wafer are high.

However, both the increase in oxygen concentration and the increase inboron concentration can promote the formation of oxygen precipitates.Therefore, it is difficult to achieve both the suppression of the slipdue to the processes and the suppression of the deformation and warp ofthe wafer due to the formation of oxygen precipitates.

When oxygen precipitates are formed in the device processes, oxygen inthe wafer is consumed and interstitial oxygen is reduced. In this case,it is considered that the extension of the generated dislocation cannotbe further suppressed, thereby further lowering the wafer strength. Asdescribed in paragraph [0042] of Patent Document 2, the devicemanufacturing processes have many restrictions to processing conditionssuch as not performing the thermal treatment at 700° C. or higher in theprocesses subsequent to the FLA process so as to suppress the diffusionof dopants and the like. Therefore, there is a need for solving theproblem with the generation of slip in a silicon wafer before performingthe device manufacturing processes.

The invention is made in consideration of the above-mentioned problems.A goal of the invention is to provide a wafer and a manufacturing methodthereof, which can reduce the precipitation of oxygen to prevent thewafer deformation from being generated and can prevent the slipextension due to boat scratches and transfer scratches serving as areason for the decrease in wafer strength, even when the wafer isprovided to a rapid temperature-rising-and-falling thermal treatmentprocess.

Another goal of the invention is to provide an epitaxial wafer whichdoes not cause the formation of precipitates in the device processes soas to prevent the local wafer deformation in the device processes andwhich has excellent slip resistance and a manufacturing method thereof.

Still another goal of the invention is to provide a silicon wafer whichdoes not cause the formation of oxygen precipitates in the wafer edgeportion in the device processes so as to prevent the local waferdeformation in the device processes and which has excellent slipresistance and a manufacturing method thereof.

Still another goal of the invention is to provide a silicon wafer whichhardly causes the formation of oxygen precipitates in bulk in spite ofperforming a DZ annealing process at a high temperature, whichsuppresses the formation of oxygen precipitates in the device processesso as to prevent the local wafer deformation in the device processes,which does not cause the formation of oxygen precipitates in the deviceprocesses, and which has excellent slip resistance, and a manufacturingmethod thereof.

Still another goal of the invention is to provide a silicon wafer whichdoes not cause the formation of oxygen precipitates in the outerperipheral edge of the wafer in the device processes so as to preventthe local wafer deformation in the outer peripheral edge of the wafer inthe device processes and which has excellent slip resistance, and amanufacturing method thereof.

Solution to Problem

In the rapid temperature-rising-and-falling thermal treatment processsuch as the FLA process and Spike-RTA process, since the treatmenttemperature (the peak temperature) is higher and the rising and fallingof temperature are performed for a very short time, the stress acting onthe wafer increases, thereby causing a deformation such as a wafer warpdue to the slip extending at the time of precipitating oxygen.Accordingly, the inventor et al. studied means for providing a waferwhich can endure the rapid temperature-rising-and-falling thermaltreatment process. First, it could be seen that the prevention of theslip extension using the oxygen precipitates in a wafer, which has beenemployed as the means for preventing the wafer deformation at the timeof performing plain thermal treatment with the same conditions as in thepast is not effective. This is because the temperature condition of therapid temperature-rising-and-falling thermal treatment process isexcessively severe and strict and thus conversely the oxygenprecipitates cause slip extension, thereby causing wafer deformation. Inthe FLA process and the Spike-RTA process, since stress states in wafersare different depending on the types of the wafers provided to thethermal treatment, it could be seen that countermeasures against thedeformation depending on the types of the wafers are necessary.

An example of the rapid temperature-rising-and-falling thermal treatmentprocess is a MOS FET annealing process with 45 nm node (hp 65). Here,the annealing process is performed at a higher temperature for a shortertime than those in the past RTA process. As shown in FIG. 3, in the MOSFET indicated by reference sign Mos, ultra-shallow junctions Mex whichare dopant-diffused regions of which the depth (junction depth) Xi fromthe substrate surface is about 20 nm are formed adjacent to a source Msand a drain Md. In the ultra-shallow junction Mex, since the box-likedopant profile shown in FIG. 4, that is, the uniformity in dopantconcentration in the region of the ultra-shallow junction Mex and thesteep variation at the boundary should be realized, the rapidtemperature-rising-and-falling thermal treatment process is performed.By performing the rapid temperature-rising-and-falling thermal treatmentprocess, the dopants can be sufficiently activated by a high heatingtemperature to lower the resistance and the dopants can be preventedfrom unnecessarily diffusing by a short heating time, and thedeactivation of the activated dopants can also be suppressed.

In this way, in order to realize the junction depth Xi less than 20 nmrequired for the 45 nm node (hp 65), the FLA process or the LSA processis performed. In the FLA process, a wafer is heated to an initialtemperature of 400° C. to 600° C., the entire surface of the wafer isirradiated with light of a short wavelength from an Xe flash lamp andthe like to rapidly heat only the outermost surface layer of the waferup to 900° C. to 1350° C. for a heating time of the millisecond timescale, and it is then rapidly cooled. In the LSA process, a wafer isheated to the initial temperature of 400° C. to 600° C. on a hot plate,the wafer is spot-scanned with a continuous wave laser to rapidly heatthe wafer equal to or higher than 1100° C. up to the vicinity of themelting point of silicon so that the heating time is changed from themicrosecond time scale to the millisecond time scale, and it is thenrapidly cooled. In the FLA process and the LSA process, treatmentconditions are selected which can realize the retention of the dopantconcentration distribution characteristic of the ultra-shallow junctionregion indicated by Mex in FIG. 3, the decrease of junction leakage, thesuppression of gate leakage, the decrease of parasitic resistance ofsource and drain, and the suppression of gate depletion.

In the FLA process performed under the above-mentioned conditions, theinternal stress generated in the wafer at the time of thermal treatmentmay reach a level of 50 to 150 MPa. The rapidtemperature-rising-and-falling thermal treatment process in theinvention is not limited to the FLA process, but may include all thesevere thermal treatments under the condition that the generatedinternal stress is greater than 20 MPa.

In the FLA process or the Spike-RTA as the rapidtemperature-rising-and-falling thermal treatment process, since thetemperature is higher and the temperature-rising rate and thetemperature-falling rate are high, a large thermal stress is caused asdescribed above. The slip dislocation is caused from large oxygenprecipitates due to the large thermal stress.

As a result, the overlay error, that is, the misalignment betweenpatterns in photolithography processes performed before and after therapid temperature-rising-and-falling thermal treatment process inmanufacturing devices, is caused.

For example, as can be seen from the manufacturing of ICs or LSIs, whena silicon wafer is exposed to a pattern, a wafer 21 is supported andfixed onto a work stage 22 by vacuum suction, a photomask 23 issupported and fixed onto a mask holder 24 above the work stage 22, thework stage 22 is lifted up to bring the thin wafer 21 into close contactwith the photomask 23, and then the wafer is exposed, as shown in FIG.5. A photoresist film (not shown) is formed on the surface of the wafer21 in advance and the photoresist film is exposed to bake a pattern ofthe photomask 23.

In FIG. 6, variations in the horizontal direction generated when apattern to be formed in a post-process of the rapidtemperature-rising-and-falling thermal treatment process is superimposedon the pattern formed on the wafer in the pre-process of the rapidtemperature-rising-and-falling thermal treatment process are indicatedby arrow lengths at the points on the wafer. The wafer isvacuum-suctioned onto the stage at the time of exposure, but when thesuctioned wafer has a deformation such as a warp, the wafer is fixed tothe stage in a state where the deformation such as a warp is correctedat the time of suctioning. Accordingly, it is thought that the patternformed on the wafer in the pre-process is deformed (horizontally shifts)by the corrected deformation of the wafer and departs from the originalposition to cause the overlay error.

It is thought that the deformation such as a warp of the wafer resultsfrom the slip dislocation generated from large precipitates. When ashift greater than a predetermined amount is caused due to thedeformation such as a warp, this variation cannot be corrected and thusthe corresponding wafer is discarded. That is, the device yield ismarkedly lowered due to the deformation of the wafer and the devicemanufacturing cost is greatly raised as a whole.

With the inventors' knowledge, the overlay error can be almost predictedon the basis of the density of BMDs (oxygen precipitates) generated. Asshown in FIG. 7, when the BMD density is greater than 5×10⁴ pcs/cm², thedeformation is rapidly generated and the maximum shift becomes greaterthan 10 nm which is the permissible level. It is thought that theincrease of the maximum shift shown in the drawing is attributed to theincrease of the magnitude of slip generated.

In the past, the gettering performance was given to the wafer by oxygenprecipitates, but the frequency where the gettering is actuallynecessary, that is, the frequency where the heavy-metal pollutionoccurs, is very small in the present device manufacturing processes.This is because the cleanliness (the ratio at which foreign particlesare not present) of a wafer with a diameter of 300 mm or the cleanlinessof a wafer with a diameter of 450 mm is much higher than the cleanlinessof fabrication lines mainly using wafers with a diameter of 200 mm andrequiring the gettering and environments in which the lines areinstalled. Accordingly, the countermeasure against the overlay errorhaving a direct influence on the device yield can be selected ratherthan the gettering which is a countermeasure against contaminations ofheavy-metal having low incidence. Therefore, the inventor et al.selected the reduction of BMDs.

In the FLA process or the spike-RTA process as the rapidtemperature-rising-and-falling thermal treatment process, the thermaltreatment is performed in a state where a ring-like susceptor comes incontact with only the edge of a wafer to support the wafer. Accordingly,when it is observed in the direction of <4,0,0> by X-ray topographyusing reflected light, slip dislocation is generated at the edge of thewafer supported as shown in FIG. 8.

When this slip dislocation is generated only in the vicinity of thesupported portion, that is, the edge of the wafer and is located withinabout 3 mm from the edge so as not to reach a device area, it is thoughtthat the slip dislocation does not have an influence on the device area.However, as a result, scratches in the wafer may be generated from theslip to lower the wafer strength, thereby causing the decrease in thedevice yield. In the past, the slip extension could be suppressed by theuse of the oxygen precipitates. However, when the oxygen precipitatescontributing to the suppression of the slip extension are present in awafer, the oxygen precipitates cause the overlay error due to the waferdeformation in the rapid temperature-rising-and-falling thermaltreatment process. Accordingly, it is preferable that othercountermeasures be considered.

Specifically, before a wafer is provided to a device process causing alarge stress, the oxygen concentration at the time of pulling an ingot,the concentration of dopants to be added at the time of pulling, and theconditions of the RTA process for dissolving precipitation nuclei areset so as to suppress the precipitation of oxygen in the wafer. Theinventor et al. found that the slip serving as a reason for thedeformation generated in the wafer in the rapidtemperature-rising-and-falling thermal treatment process can besuppressed by properly setting the conditions. The inventor et al. foundthat the slip extension resulting from boat scratches and transferscratches, which cause a problem in processes other than the rapidtemperature-rising-and-falling thermal treatment process, can beprevented by properly setting the conditions as in examples to bedescribed later.

<First Aspect>

(A1) A first aspect of the invention provides a method of manufacturinga silicon epitaxial wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature is equal to or higher than 1050° C. and equal to orlower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: an epitaxial process of causing an epitaxial layer togrow on the surface of a substrate, which is doped with boron so as tohave resistivity of 0.02 Ωcm to 1 kΩcm and of which the initial oxygenconcentration Oi is in the range of 14.0×10¹⁷ to 22×10¹⁷ atoms/cm³(Old-ASTM); and a precipitation, dissolution, and thermal treatmentprocess of treating a wafer in the treatment temperature range of 1150°C. to 1300° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec, wherein theprecipitation, dissolution, and thermal treatment process is performedbefore or after the epitaxial process.

(A2) The first aspect of the invention also provides a method ofmanufacturing a silicon epitaxial wafer which is provided to asemiconductor device manufacturing process having a thermal treatmentprocess of which the highest temperature is equal to or higher than1050° C. and equal to or lower than the melting point of silicon and ofwhich the temperature rising and falling rate is equal to or higher than150° C./sec, the method including: an epitaxial process of causing anepitaxial layer to grow on the surface of a substrate, which is dopedwith nitrogen of 1×10¹³ to 5×10¹⁴ atoms/cm³; and a precipitation,dissolution, and thermal treatment process of treating a wafer in thetreatment temperature range of 1200° C. to 1300° C., the retention timerange of 5 sec to 1 min, and the temperature-falling rate range of 10°C./sec to 0.1° C./sec after the epitaxial process.

(A3) The first aspect of the invention also provides a method ofmanufacturing a silicon epitaxial wafer which is provided to asemiconductor device manufacturing process having a thermal treatmentprocess of which the highest temperature is equal to or higher than1050° C. and equal to or lower than the melting point of silicon and ofwhich the temperature rising and falling rate is equal to or higher than150° C./sec, the method including: an epitaxial process of causing anepitaxial layer to grow on the surface of a substrate, which is dopedwith boron so as to have resistivity of 0.020 Ωcm to 0.001 Ωcm and ofwhich the initial oxygen concentration Oi is in the range of 11.0×10¹⁷to 3×10¹⁷ atoms/cm³ (Old-ASTM).

(A4) The first aspect of the invention also provides a method ofmanufacturing a silicon epitaxial wafer which is provided to asemiconductor device manufacturing process having a thermal treatmentprocess of which the highest temperature is equal to or higher than1050° C. and equal to or lower than the melting point of silicon and ofwhich the temperature rising and falling rate is equal to or higher than150° C./sec, the method including: an epitaxial process of causing anepitaxial layer to grow on the surface of a substrate, which is dopedwith boron so as to have resistivity of 0.02 Ωcm to 0.001 Ωcm and ofwhich the initial oxygen concentration Oi is in the range of 11.0×10¹⁷to 18×10¹⁷ atoms/cm³ (Old-ASTM); and a precipitation, dissolution, andthermal treatment process of treating a wafer in the treatmenttemperature range of 1150° C. to 1300° C., the retention time range of 5sec to 1 min, and the temperature-falling rate range of 10° C./sec to0.1° C./sec before the epitaxial process.

(A5) In the method of manufacturing a silicon epitaxial wafer describedin any one of (A1) to (A4), the treatment atmosphere in theprecipitation, dissolution, and thermal treatment process may be set toan atmosphere of non-oxidizing gas not containing nitrogen.

(A6) In the method of manufacturing a silicon epitaxial wafer describedin any one of (A1) to (A4), the treatment atmosphere in theprecipitation, dissolution, and thermal treatment process may be set toa mixed atmosphere of non-oxidizing gas not containing 1% or more ofnitrogen and oxygen gas.

(A7) In the method of manufacturing a silicon epitaxial wafer describedin any one of (A1) to (A4), the treatment atmosphere in theprecipitation, dissolution, and thermal treatment process may be set toa mixed atmosphere of non-oxidizing gas not containing 3% or more ofnitrogen and oxygen gas, and the temperature falling rate may be set tobe in the range from 50° C./sec to 20° C./sec.

(A8) A silicon epitaxial wafer according to the invention may bemanufactured by the method of manufacturing a silicon epitaxial waferdescribed in any one of (A1) to (A7).

(RTA Process on High-Oxygen p-Wafer Before or after Epi)

The method of manufacturing a silicon epitaxial wafer according to thefirst aspect of the invention is a method of manufacturing a siliconepitaxial wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature is equal to or higher than 1050° C. and equal to orlower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: an epitaxial process of causing an epitaxial layer togrow on the surface of a substrate, which is doped with boron so as tohave resistivity of 0.02 Ωcm to 1 kΩcm and of which the initial oxygenconcentration Oi is in the range of 14.0×0¹⁷ to 22×10¹⁷ atoms/cm³(Old-ASTM); and a precipitation, dissolution, and thermal treatmentprocess of treating a wafer in the treatment temperature range of 1150°C. to 1300° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec before orafter the epitaxial process.

In the method of manufacturing an epitaxial silicon wafer according tothe first aspect of the invention, in a p-wafer in which a high oxygenconcentration is set and a boron concentration having a slip extensionsuppressing effect is set to be relatively low by the setting at thetime of pulling a single crystal silicon, oxygen precipitation nucleicausing a wafer deformation can be dissolved through the use of theprecipitation, dissolution, and thermal treatment process. Accordingly,even when a silicon wafer obtained by the use of the manufacturingmethod according to the first aspect of the invention is provided to therapid temperature-rising-and-falling thermal treatment process of thedevice manufacturing processes of which the conditions are more severethan those in the past RTA process and are severe conditions in whichthe highest temperature is in the range of 1050° C. to the melting pointof silicon, the temperature rising and falling rate is in the range of150° C./sec to 10000° C./sec, preferably in the range of 500° C./sec to3000° C./sec, and more preferably in the range of 1000° C./sec to 2000°C./sec, and the maximum stress generated in the silicon wafer is greaterthan 20 Mpa, it is possible to prevent deformation of the wafer. In themanufacturing method according to the first aspect of the invention, itis also possible to provide a silicon wafer which can prevent slipextension resulting from boat scratches and transfer scratches causingthe lowering of the wafer strength.

The inventor et al. found a countermeasure which can achieve both theprevention of generation of wafer deformation and the prevention ofgeneration of a slip in the silicon wafer manufacturing process.

In the first aspect of the invention, the treatment temperature in theepitaxial process has only to be lower than the treatment temperature inthe precipitation, dissolution, and thermal treatment process and can beset to a general condition (for example, equal to or higher than 1000°C. and equal to or lower than 1100° C.). The temperature-falling ratemeans a cooling rate at least in the range of the highest temperature(for example, equal to or higher than 1050° C. and equal to or lowerthan 1400° C.) to 700° C., which is a range greatly contributing todissolution the precipitates. The concentrations of dopants of boron inthe epitaxial layer are set on the basis of the device standard to beformed but have a small contribution to the slip or deformation in theinvention. Accordingly, an epitaxial layer having any dopantconcentration can be employed.

(N-Doped Version High-Temperature RTA)

According to the first aspect of the invention, the method ofmanufacturing a silicon epitaxial wafer which is provided to asemiconductor device manufacturing process having a thermal treatmentprocess of which the highest temperature is equal to or higher than1050° C. and equal to or lower than the melting point of silicon and ofwhich the temperature rising and falling rate is equal to or higher than150° C./sec includes: an epitaxial process of causing an epitaxial layerto grow on the surface of a substrate, which is doped with nitrogen of1×10¹³ to 5×10¹⁴ atoms/cm³; and a precipitation, dissolution, andthermal treatment process of treating a wafer in the treatmenttemperature range of 1200° C. to 1300° C., the retention time range of 5sec to 1 min, and the temperature-falling rate range of 10° C./sec to0.1° C./sec after the epitaxial process. In the method of manufacturinga silicon epitaxial wafer according to the first aspect of theinvention, it is possible to achieve both the prevention of generationof wafer deformation and the prevention of generation of a slip in thep-wafer which is doped with nitrogen and in which oxygen precipitatescan be easily formed.

(Low-Oxygen p/p+, p/p++ Wafer)

According to the first aspect of the invention, the method ofmanufacturing a silicon epitaxial wafer which is provided to asemiconductor device manufacturing process having a thermal treatmentprocess of which the highest temperature is equal to or higher than1050° C. and equal to or lower than the melting point of silicon and ofwhich the temperature rising and falling rate is equal to or higher than150° C./sec includes an epitaxial process of causing an epitaxial layerto grow on the surface of a substrate, which is doped with boron so asto have resistivity of 0.02 Ωcm to 0.001 Ωcm and of which the initialoxygen concentration Oi is in the range of 11.0×10¹⁷ to 3×10¹⁷ atoms/cm³(Old-ASTM). In the method of manufacturing a silicon epitaxial waferaccording to the first aspect of the invention, it is possible toachieve both the prevention of generation of wafer deformation and theprevention of generation of a slip in the silicon wafer manufacturingprocess even in a p+ wafer or a p++ wafer in which a low oxygenconcentration is set by the setting at the time of pulling and the boronconcentration having the slip extension suppressing effect is relativehigh.

In the first aspect of the invention, when the oxygen concentration ofthe silicon single crystal is set to the above-mentioned range of oxygenconcentration of the silicon wafer at the time of pulling a siliconsingle crystal (silicon ingot), from which silicon wafers are obtainedby slicing, by a CZ (Czochralski) method, it can be coped with throughthe use of the application of a magnetic field to a silicon melt, thecrucible and crystal rotation control, and the like. However, when anormal CZ method is used, it may be difficult to set the interstitialoxygen concentration to 4×10¹⁷ atoms/cm³ or less. Therefore, in the caseof a low oxygen concentration, the interstitial oxygen concentration canbe set to 4×10¹⁷ atoms/cm³ or less by the use of an MCZ method (MagneticCZ method) of applying a magnetic field to the silicon melt to pull asingle crystal. By setting the rotations of a quartz crucible and apulled single crystal to a low speed, it is also possible to lower theinterstitial oxygen concentration.

Actually, when the number of rotations of the quartz crucible is R1(rpm) and the number of rotations of the crystal is R2 (rpm), R1 and R2can be set within the range of 0.1 to 2 and the range of 1 to 7,respectively, so as to satisfy the following conditions.

That is, R2<7−5(R1−0.5) is satisfied when R1 is in the range of 0.5 to0.7, R2<6 is satisfied when R1 is in the range of 0.7 to 1, andR2<6−4(R1−1) is satisfied when R1 is in the range of 1 to 2.

In this case, the interstitial oxygen concentration in the singlecrystal can be set to 4×10¹⁷ atoms/cm³ or less and the silicon singlecrystal with a low oxygen concentration can be pulled.

The number of rotations R1 (rpm) of the silica quartz and the number ofrotations R2 (rpm) of the crystal can be set within the range of 0.1 to2 and the range of 1 to 7, respectively, so as to satisfy the followingconditions.

That is, R2<7−5(R1−0.3) is satisfied when R1 is in the range of 0.3 to0.5, R2<6 is satisfied when R1 is in the range of 0.5 to 0.7, andR2<6−3.4(R1−0.7) is satisfied when R1 is in the range of 0.7 to 1.

In this case, the interstitial oxygen concentration in the singlecrystal can be set to 3.5×10¹⁷ atoms/cm³ or less and a silicon singlecrystal with a low oxygen concentration can be provided.

In the first aspect of the invention, a horizontal magnetic field or acusp magnetic field may be employed as the magnetic field to be appliedto the silicon melt. For example, the intensity of the horizontalmagnetic field can be set to the range of 3000 to 5000 G (0.3 T to 0.5T). When the intensity of the magnetic field is less than the range, theconvection suppression effect in the silicon melt is not sufficient, theshape of a solid-liquid interface cannot be set to a desirable shape,and the oxygen concentration cannot be sufficiently lowered, which isnot preferable. When the intensity of the magnetic field is greater thanthe range, the convection is excessively suppressed, thehigh-temperature silicon melt deteriorates the inner surface of thequartz crucible, and thus the dislocation-free rate of the crystal islowered, which is not preferable.

In the invention, the relationship between the central position of themagnetic field and the position of the melt surface at the time ofpulling the crystal is preferably set to the range of −75 mm to +50 mmand more preferably to the range of −20 mm to +45 mm. Here, the centralposition of the horizontal magnetic field means a height position atwhich the center of a magnetic field generating coil is located. −75 mmmeans that the central position of the magnetic field is located 75 mmdown from the melt level. +50 mm means that the central position of themagnetic field is located 50 mm up from the melt level.

By using the CZ method or the MCZ method to pull a crystal, it ispossible to suppress the convection of the silicon melt, to reduce theamount of quartz crucible melted, to reduce the dopant concentration inthe quartz crucible by using a synthetic quartz crucible, therebygrowing a CZ crystal with a quality closer to an FZ crystal.

Here, the synthetic quartz crucible means that at least the innersurface coming in contact with the raw melt is formed of the followingsynthetic quartz.

The synthetic quartz is a raw material which is chemically synthesizedand produced and the synthetic fused silica powder is amorphous. The rawmaterial of the synthetic quartz is gaseous or liquid and thus can beeasily refined. The purity of the synthetic silica powder can be made tobe higher than that of a natural quartz powder. Examples of the rawmaterial of the synthetic fused silica include a gaseous material suchas carbon tetrachloride and a liquid material such as silicon alkoxide.In the synthetic fused silica powder, all dopants can be set to 0.1 ppmor less.

The glass acquired by melting the synthetic fused silica powdertransmits ultraviolet rays of a wavelength of 200 nm or less well, asthe result of measuring the optical transmittance. That is, it isthought that the glass has a characteristic close to the synthetic fusedsilica acquired using carbon tetrachloride used for ultraviolet opticsas a raw material.

When the fluorescence spectrum acquired by exciting the glass, which isacquired by melting the synthetic fused silica powder, with anultraviolet ray of a wavelength of 245 nm is measured, the fluorescencepeak like the melt of a natural quartz powder is not seen.

By measuring the dopant concentration, the amount of silanol, theoptical transmittance, or the fluorescence spectrum acquired by excitingit with an ultraviolet ray of a wavelength of 245 nm, it can bedetermined whether the quartz material is natural quartz or syntheticquartz.

In the first aspect of the invention, in order to control a gas flowstate of the surface of the silicon melt, it is required that thefurnace pressure is equal to or higher than 10 Torr (1.3 kPa),preferably in the range of 30 Torr to 200 Torr (4.0 to 27 kPa), and morepreferably in the range of 30 Torr to 70 Torr (4.0 to 9.3 kPa). When thefurnace pressure is raised, the gas flow rate of an inert gas such as Aron the melt is lowered and the reactant gas such as SiO vaporized fromthe melt is not exhausted well, and thus the oxygen concentration in thecrystal is raised. SiO is not exhausted but agglomerates in a portion ofthe melt surface in the furnace with a temperature of about 1100° C. orlower, thereby generating dust. This dust is dropped to the melt,thereby causing the crystal dislocation. As the upper limit of thefurnace pressure, the above-mentioned upper limit is defined to preventthis problem.

In the first aspect of the invention, by setting the flow rate of theatmosphere gas supplied to the CZ furnace to the range of 100 to 200L/min and setting the pressure of the CZ furnace to 6700 pa or less, itis possible to effectively exhaust SiO vaporized from the surface of themelt to the outside of the equipment and to drive particles floating onthe surface of the melt to the wall of the crucible, thereby preventingthe oxygen concentration in the crystal from being increased.

(Before Epi and after RTA Process on High-Oxygen p+, p++ Wafer)

According to the first aspect of the invention, the method ofmanufacturing a silicon epitaxial wafer which is provided to asemiconductor device manufacturing process having a thermal treatmentprocess of which the highest temperature is equal to or higher than1050° C. and equal to or lower than the melting point of silicon and ofwhich the temperature rising and falling rate is equal to or higher than150° C./sec includes: an epitaxial process of causing an epitaxial layerto grow on the surface of a substrate, which is doped with boron so asto have resistivity of 0.02 Ωcm to 0.001 Ωcm and of which the initialoxygen concentration Oi is 11.0×10¹⁷ to 18×10¹⁷ atoms/cm³ (Old-ASTM);and a precipitation, dissolution, and thermal treatment process oftreating a wafer in the treatment temperature range of 1150° C. to 1300°C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec before theepitaxial process. In the method of manufacturing a silicon epitaxialwafer according to the first aspect of the invention, it is possible toachieve both the prevention of generation of wafer deformation and theprevention of generation of a slip even in a p+ wafer or a p++ wafer inwhich a high oxygen concentration is set by the setting at the time ofpulling and the boron concentration having the oxygen precipitationincreasing effect is relative high.

In the precipitation, dissolution, and thermal treatment process in thefirst aspect of the invention, the treatment atmosphere is set to anyone of the atmosphere of non-oxidizing gas not containing nitrogen, themixed atmosphere of non-oxidizing gas not containing nitrogen and oxygengas of 1% or more, and the mixed atmosphere of non-oxidizing gas notcontaining nitrogen and oxygen gas of 3% or more and the temperaturefalling rate is set to be in the range of 50° C./sec to 20° C./sec. Inthis way, by performing the process in the atmosphere not containingnitrogen which is vacancy-injection gas, it is possible to achieve boththe prevention of generation of wafer deformation and the prevention ofgeneration of a slip. In addition, when the oxygen concentration isrelative high, it is possible to achieve both the prevention ofgeneration of wafer deformation and the prevention of generation of aslip, by setting the temperature-falling rate to be higher. In the mixedatmosphere, the upper limit of the oxygen gas concentration is set to10%.

The silicon epitaxial wafer according to the first aspect of theinvention is manufactured by the use of the above-mentioned methods ofmanufacturing a silicon epitaxial wafer. Accordingly, it is possible toachieve both the prevention of generation of the deformation such as awarp of the wafer, which causes the overlay error shown in FIG. 6, andthe prevention of generation of the slip dislocation in the edge of thewafer, which is supported as shown in FIG. 5.

<Second Aspect>

(B1) A second aspect of the invention provides a method of manufacturinga silicon wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature is equal to or higher than 1050° C. and equal to orlower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: a silicon single crystal pulling process of pulling astraight body portion of a silicon single crystal as a defect-freeregion not having grown-in defects using the Czochralski method; amirror treatment process of mirror finishing a sliced wafer; and aprecipitation, dissolution, and thermal treatment process of treating awafer in the atmosphere of non-oxidizing gas not containing nitrogen inthe treatment temperature range of 950° C. to 1200° C., with a retentiontime range of 5 sec to 1 min, and with a temperature-falling rate rangeof 10° C./sec to 0.1° C./sec, wherein the precipitation, dissolution,and thermal treatment process is performed before or after the mirrortreatment process.

(B2) The second aspect of the invention also provides a method ofmanufacturing a silicon wafer which is provided to a semiconductordevice manufacturing process having a thermal treatment process of whichthe highest temperature is equal to or higher than 1050° C. and equal toor lower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: a silicon single crystal pulling process of pulling astraight body portion of a silicon single crystal using the Czochralskimethod so as to include a defect-free region not having grown-in defectsand an OSF region; a mirror treatment process of mirror finishing asliced wafer; and a precipitation, dissolution, and thermal treatmentprocess of treating a wafer in the atmosphere of non-oxidizing gas notcontaining nitrogen in the treatment temperature range of 1225° C. to1350° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec, wherein theprecipitation, dissolution, and thermal treatment process is performedbefore or after the mirror treatment process.

(B3) In the method of manufacturing a silicon wafer according to thesecond aspect of the invention described in (B1) or (B2), the treatmentatmosphere in the precipitation, dissolution, and thermal treatmentprocess may be set to a mixed atmosphere of non-oxidizing gas notcontaining nitrogen and oxygen gas of 3% or more.

(B4) In the method of manufacturing a silicon wafer according to thesecond aspect of the invention described in any one of (B1) to (B3), theinitial oxygen concentration Oi in the silicon single crystal pullingprocess may be set to be in the range of 12.0×10¹⁷ to 20×10¹⁷ atoms/cm³(Old-ASTM).

(B5) A silicon wafer according to the second aspect of the invention ismanufactured using the method of manufacturing a silicon wafer describedin any one of (B1) to (B4)

The method of manufacturing a silicon wafer according to the secondaspect of the invention is a method of manufacturing a silicon waferwhich is provided to a semiconductor device manufacturing process havinga thermal treatment process of which the highest temperature is equal toor higher than 1050° C. and equal to or lower than the melting point ofsilicon and of which the temperature rising and falling rate is equal toor higher than 150° C./sec, the method including: a silicon singlecrystal pulling process of pulling a straight body portion of a siliconsingle crystal as a defect-free region not having grown-in defects usingthe Czochralski method; a mirror treatment process of mirror finishing asliced wafer; and a precipitation, dissolution, and thermal treatmentprocess of treating a wafer in the atmosphere of non-oxidizing gas notcontaining nitrogen in the treatment temperature range of 950° C. to1200° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec, wherein theprecipitation, dissolution, and thermal treatment process is performedbefore or after the mirror treatment process.

In the method of manufacturing a silicon wafer according to the secondaspect of the invention, the grown-in defects are free at the time ofpulling a silicon single crystal and the oxygen precipitation nucleicausing a wafer deformation is dissolved through the use of theprecipitation, dissolution, and thermal treatment process. Accordingly,even when the silicon wafer is provided to the rapidtemperature-rising-and-falling thermal treatment process of the devicemanufacturing processes of which the conditions are more severe thanthose in the past RTA process and are severe conditions in which thehighest temperature is in the range of 1050° C. to the melting point ofsilicon, the temperature rising and falling rate is in the range of 150°C./sec to 10000° C./sec, preferably in the range of 500° C./sec to 3000°C./sec, and more preferably in the range of 1000° C./sec to 2000°C./sec, and the maximum stress generated in the silicon wafer is greaterthan 20 Mpa, it is possible to prevent deformation of the wafer. It isalso possible to provide a silicon wafer which can prevent slipextension resulting from boat scratches and transfer scratches causingthe lowering of the wafer strength.

The inventor et al. found conditions to be set at the time of pulling asingle crystal using the Czochralski method as a countermeasure whichcan achieve both the prevention of generation of wafer deformation andthe prevention of generation of a slip in the silicon wafermanufacturing process.

In the method of manufacturing a silicon wafer according to the secondaspect of the invention, a silicon single crystal is pulled at a pullingspeed at which a silicon single crystal with grown-in defects free canbe pulled at the time of pulling the silicon single crystal using theCzochralski method.

The “grown-in defects are free” in the invention means that all defectswhich may be generated at the time of pulling a crystal, such as COPdefects or dislocation clusters, are excluded. It can exclude the OSFregion and can include the Pv region and Pi region.

The OSF region can be actualized by the following method. First, a waferis heated from 900° C. to 1000° C. at a temperature-rising rate of 5°C./min in a dry oxygen atmosphere and is then held in the dry oxygenatmosphere at 1000° C. for 1 hour. Thereafter, the wafer is heated from1000° C. to 1150° C. at the temperature-rising rate of 3° C./min in thewet oxygen atmosphere and is held in the wet oxygen atmosphere at 1150°C. for 2 hours. Thereafter, the thermal treatment lowering thetemperature to 900° C. is performed and the Wright etching of 2 μm isperformed to actualize the OSF region. The OSF region means a region inwhich the OSF density is equal to or more than 10 pcs/cm², as themeasurement result of the wafer in-plane OSF density distribution of theactualized OSF region. When the OSF region is actualized as describedabove and the region in which the OSF density is equal to or more than10 pcs/cm² is not present at the measurement result of the waferin-plane density distribution of the actualized OSF region, it isdetermined that the OSF region is not present, that is, the OSF regioncan be excluded.

When a silicon single crystal ingot is pulled by the Czochralski method,the region in which interstitial silicon type point defects aredominantly present in the ingot is defined as an I region, the region inwhich vacancy type point defects are dominantly present is defined as aV region, and the region in which agglomerates of the interstitialsilicon type point defects and agglomerates of the vacancy type pointdefects are not present is defined as a P region. At this time, theregion which is adjacent to the I region, which belongs to the P region,and of which the interstitial silicon concentration is less than theleast interstitial silicon concentration causing an interstitialdislocation is defined as a Pi region. The region which is adjacent tothe OSF region, which belongs to the P region, and of which the vacancyconcentration is equal to or less than the vacancy concentration causingthe COP defects is defined as a Pv region.

The silicon wafer is manufactured by pulling an ingot from the siliconmelt in the pulling furnace at a predetermined pulling speed profilebased on the Voronkov theory by the use of the CZ method and cutting theingot. In general, when the silicon single crystal ingot is pulled fromthe silicon melt in the furnace using the CZ method, point defects andagglomerates (three-dimensional defects) of the point defects aregenerated as defects in the silicon single crystal. The point defectscan be generally classified into two types of vacancy type point defectsand interstitial silicon type point defects. The vacancy means a spaceformed by causing a silicon atom to depart from a normal position in asilicon crystal lattice. The defects based on the vacancy are thevacancy type point defects. On the other hand, a silicon atom located ata position (interstitial site) other than the lattice points of asilicon crystal is called interstitial silicon.

The point defects are generally formed in the contact surface betweenthe silicon melt (molten silicon) and the ingot (solid silicon).However, by continuously pulling the ingot, the portion which was thecontact surface starts its cooling at the same time as the pulling.While the portion is cooled, the vacancies or the interstitial siliconatoms diffuse and the COP defects which are vacancy agglomerates and thedislocation clusters which are interstitial agglomerates are formed. Inother words, the agglomerates have a three-dimensional structured basedon the agglomeration of the point defects. The agglomerates of thevacancy type point defects include defects called LSTD (Laser ScatteringTomograph Defects) or FPD (Flow Pattern Defects) in addition to the COPdefects. The agglomerates of the interstitial silicon type point defectsinclude defects called the LD. The FPD is a trace source indicating asingular flow pattern which appears when a silicon wafer manufactured bycutting an ingot is subjected to Secco etching (etching using a mixedsolution of HF:K₂Cr₂O₇ (0.15 mol/L)=2:1) for 30 minutes. The LSTD is asource generating scattered light with a refractive index different fromthat of silicon when the silicon single crystal is irradiated withinfrared rays.

In the Voronkov theory, when the ingot pulling speed is V (mm/min) andthe temperature gradient in the vertical direction of the ingot in thevicinity of the interface of the ingot and the silicon melt is G (°C./mm), V/G (mm²/min° C.) is controlled so as to cause a high-purityingot to grow with a smaller number of defects.

As the value of V/G varies from a high value to a low value, the Vregion, the OSF region, the Pv region, the Pi region, and the I regionare sequentially formed in the ingot.

The value of V/G defining the boundaries of the regions decreases in theorder of a threshold value defining the boundary between the V regionand the OSF region, a threshold value defining the boundary between theOSF region and the Pv region, a threshold value defining the boundarybetween the Pv region and the Pi region, and a threshold value definingthe boundary between the Pi region and the I region.

The value of V/G varies depending on actual equipment such as thestructure of a hot zone in the upper part of the pulling furnace, butcan be distinguished by measuring the COP density, the OSF density, theBMD density, the LSTD or FPD density, the Wright etching defect density,and the like.

The “Wright etching defects” are defects detected by the followingmethod. First, an As-grown silicon single crystal wafer is immersed inan aqueous solution of copper sulfate, is then naturally dried, and issubjected to the thermal treatment in the nitrogen atmosphere at 900° C.for about 20 minutes and the Cu decoration. Thereafter, in order toremove a Cu silicide layer on the sample surface layer, the resultant isimmersed in a HF/HNO₃ mixture solution and the surface layer is removedby several micrometers by etching. Thereafter, the wafer surface isetched by 2 μm by the Wright etching (the chromic acid etching) and theWright etching defects are detected by the use of an optical microscope.According to this evaluation method, by performing the Cu decoration onthe dislocation clusters formed at the time of pulling the crystal, thedislocation clusters can be actualized and can be detected with highsensitivity. That is, the Wright etching defects include the dislocationclusters.

The “LSD density” is a density of defects with a size of 0.1 μm orlarger which are detected by the use of a laser scattering particlecounter (SP1 (surfscan SP1) which is a product made by KLA-TencorCorporation).

A silicon single crystal pulled by the following method is used in thesilicon wafer according to the second aspect of the invention. That is,at the time of pulling a silicon single crystal by the use of theCzochralski method, a hydrogen-containing material having a partialpressure in terms of hydrogen gas in the range of 40 Pa to 400 Pa isintroduced into the atmosphere gas in the CZ furnace and the siliconsingle crystal pulling speed is set to a speed at which a silicon singlecrystal with grown-in defects free can be pulled. The atmospherecontaining only the inert gas and not containing hydrogen gas may beemployed.

The hydrogen-containing material is a material containing a hydrogenatom in its molecule and is a gaseous material which is thermallydecomposed to generate hydrogen gas when it is melted in the siliconmelt. The hydrogen-containing material includes hydrogen gas itself. Bymixing the hydrogen-containing material into the inert gas andintroducing the mixed gas into the atmosphere at the time of forming anecking part, it is possible to enhance the hydrogen concentration inthe silicon melt. Specific examples of the hydrogen-containing materialinclude inorganic compounds such as hydrogen gas, H₂O, and HClcontaining a hydrogen atom, hydrocarbon such as silane gas, CH₄, andC₂H₂, and organic compounds such as alcohol and carboxylic acidcontaining a hydrogen atom. The hydrogen gas is particularly preferablyused. Cheap Ar gas can be preferably used as the atmosphere gas in theCZ furnace, and single substances of various rare gas such as He, Ne,Kr, and Xe or mixed gas thereof can be also used.

The concentration of the hydrogen-containing material in thehydrogen-containing atmosphere is set to be in the range of 40 Pa to 400Pa as a partial pressure in terms of hydrogen gas. Here, the partialpressure in terms of hydrogen gas is used because the amount of hydrogenatoms that can be obtained by thermally decomposing thehydrogen-containing material depends on the amount of hydrogen atomsoriginally contained in the hydrogen-containing material. For example, 1mol of H₂ is contained in 1 mol of H₂O but only 0.5 mol of H₂ iscontained in 1 mol of HCl. Accordingly, in the invention, by using thehydrogen-gas atmosphere in which hydrogen gas is introduced into theinert gas with a partial pressure of 40 to 400 Pa as a referenceatmosphere, the concentration of the hydrogen-containing material ispreferably determined to obtain the atmosphere equivalent to thereference atmosphere. The preference pressure of the hydrogen-containingmaterial is defined as the partial pressure in terms of hydrogen gas.

That is, assumed that the hydrogen-containing material is melted in thesilicon melt and is changed to hydrogen atoms by the thermaldecomposition in the high-temperature silicon melt, the amount ofhydrogen-containing material to be added can be adjusted so that thepartial pressure in terms of hydrogen gas in the changed atmosphere isin the range of 40 to 400 Pa.

In the method of manufacturing a silicon single crystal wafer accordingto the second aspect of the invention, the allowable range of the speedat which the silicon single crystal with grown-in defects free can bepulled can be widened by introducing the hydrogen-containing materialinto the atmosphere so that the partial pressure in terms of hydrogengas is in the range of 40 Pa to 400 Pa. That is, it is possible toenlarge the pulling speed margin and thus to easily manufacture a waferincluding the Pv and Pi regions and excluding the COP defects and thedislocation clusters in the entire region in the crystal diameterdirection.

In the second aspect of the invention, it is preferable that the ingotis pulled so that the Pv region is not present in the region within 20mm in the diameter direction from the outer peripheral edge of the wafertoward the center of the wafer and the other region includes the Piregion. For this purpose, for example, the V/G in the pulling atmospherenot containing hydrogen can be set to be in the range of 0.22 to 0.15(mm²)/(° C.min).

According to the second aspect of the invention, the method ofmanufacturing a silicon wafer which is provided to a semiconductordevice manufacturing process having a thermal treatment process of whichthe highest temperature is equal to or higher than 1050° C. and equal toor lower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec includes:a silicon single crystal pulling process of pulling a straight bodyportion of a silicon single crystal using the Czochralski method so asto include a defect-free region not having grown-in defects and an OSFregion; a mirror treatment process of mirror finishing a sliced wafer;and a precipitation, dissolution, and thermal treatment process oftreating a wafer in the atmosphere of non-oxidizing gas not containingnitrogen in the treatment temperature range of 1225° C. to 1350° C., theretention time range of 5 sec to 1 min, and the temperature-falling raterange of 10° C./sec to 0.1° C./sec, and the precipitation, dissolution,and thermal treatment process is performed before or after the mirrortreatment process.

In this way, by setting the temperature condition in the precipitation,dissolution, and thermal treatment process to be higher than thetemperature condition in the state not containing the OSF defects, it ispossible to achieve both the prevention of generation of waferdeformation and the prevention of generation of a slip.

In the second aspect of the invention, by using a mixed atmosphere ofnon-oxidizing gas not containing 3% or more of nitrogen and oxygen gasas the treatment atmosphere in the precipitation, dissolution, andthermal treatment process, it is possible to achieve both the preventionof generation of wafer deformation and the prevention of generation of aslip.

In the method of manufacturing a silicon wafer according to the secondaspect of the invention, the initial oxygen concentration Oi in thesilicon single crystal pulling process may be set to be in the range of12.0×10¹⁷ to 20×10¹⁷ atoms/cm³ (Old-ASTM). In this way, by setting thesilicon single crystal to a high oxygen concentration by the setting atthe time of pulling, it is also possible to achieve both the preventionof generation of wafer deformation and the prevention of generation of aslip.

The silicon wafer according to the second aspect of the invention ismanufactured by the use of the above-mentioned methods of manufacturinga silicon wafer. Accordingly, it is possible to achieve both theprevention of generation of the deformation such as a warp of the wafer,which causes the overlay error shown in FIG. 6, and the prevention ofgeneration of the slip dislocation in the edge of the wafer, which issupported as shown in FIG. 5.

<Third Aspect>

(C1) A third aspect of the invention provides a method of manufacturinga silicon wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature is equal to or higher than 1050° C. and equal to orlower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: a silicon single crystal pulling process of pulling astraight body portion of a silicon single crystal as a region havingvoid defects using the Czochralski method; a precipitation, dissolution,and thermal treatment process of treating a wafer in the atmosphere ofnon-oxidizing gas not containing nitrogen in the treatment temperaturerange of 950° C. to 1200° C., the retention time range of 5 sec to 1min, and the temperature-falling rate range of 10° C./sec to 0.1°C./sec; and a DZ treatment process of performing high-temperatureannealing treatment on a sliced wafer in the atmosphere of non-oxidizinggas of H₂ and/or Ar at 1100° C. or higher for 30 min or more toeliminate the void defect in the wafer surface layer which is a deviceforming region after the precipitation, dissolution, and thermaltreatment process.

(C2) The third aspect of the invention provides a method ofmanufacturing a silicon wafer which is provided to a semiconductordevice manufacturing process having a thermal treatment process of whichthe highest temperature is equal to or higher than 1050° C. and equal toor lower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: a silicon single crystal pulling process of pulling astraight body portion of a silicon single crystal as a region beingdoped with nitrogen of 1×10¹³ to 5×10¹⁴ atoms/cm³ and having a voiddefect using the Czochralski method; a precipitation, dissolution, andthermal treatment process of treating a wafer in the atmosphere ofnon-oxidizing gas not containing nitrogen in the treatment temperaturerange of 1225° C. to 1350° C., the retention time range of 5 sec to 1min, and the temperature-falling rate range of 10° C./sec to 0.1°C./sec; and a DZ treatment process of performing high-temperatureannealing treatment on a sliced wafer in the atmosphere of non-oxidizinggas of H₂ and/or Ar at 1100° C. or higher for 30 min or more toeliminate the void defect in the wafer surface layer which is a deviceforming region after the precipitation, dissolution, and thermaltreatment process.

(C3) In the method of manufacturing a silicon wafer described in (C1) or(C2), the treatment atmosphere in the precipitation, dissolution, andthermal treatment process may be set to a mixed atmosphere ofnon-oxidizing gas not containing 1% or more of nitrogen and oxygen gas.

(C4) In the method of manufacturing a silicon wafer described in any oneof (C1) to (C3), the initial oxygen concentration Oi in the siliconsingle crystal pulling process may be set to be in the range of12.0×10¹⁷ to 18×10¹⁷ atoms/cm³ (Old-ASTM).

(C5) A silicon wafer according to the third aspect of the invention ismanufactured by the method of manufacturing a silicon wafer described inany one of (C1) to (C4).

(C6) In the silicon wafer described in (C5), the oxygen precipitatedensity may be equal to or less than 1×10⁴ pcs/cm² after performingthermal treatment at 1000° C. for 16 hours.

According to the third aspect of the invention, the method ofmanufacturing a silicon wafer which is provided to a semiconductordevice manufacturing process having a thermal treatment process of whichthe highest temperature is equal to or higher than 1050° C. and equal toor lower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec includes:a silicon single crystal pulling process of pulling a straight bodyportion of a silicon single crystal as a region having a void defectusing the Czochralski method; a precipitation, dissolution, and thermaltreatment process of treating a wafer in the atmosphere of non-oxidizinggas not containing nitrogen in the treatment temperature range of 950°C. to 1200° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec; and a DZtreatment process of performing high-temperature annealing treatment ona sliced wafer in the atmosphere of non-oxidizing gas of H₂ and/or Ar at1100° C. or higher for 30 min or more to eliminate the void defect inthe wafer surface layer which is a device forming region after themirror treatment process.

By performing the precipitation, dissolution, and thermal treatmentprocess on the wafer in the atmosphere of non-oxidizing gas notcontaining nitrogen in the treatment temperature range of 950° C. to1200° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec beforeperforming the DZ treatment process, it is possible to prevent thedeformation even when it is provided to the rapidtemperature-rising-and-falling thermal treatment process. Accordingly,even in a so-called annealed wafer which is manufactured by pulling aningot at a high pulling speed, which includes the V region having voiddefects, and in which the BMD can be easily formed, the oxygenprecipitation nuclei causing the deformation can be dissolved throughthe use of the precipitation, dissolution, and thermal treatmentprocesses. Therefore, even when the annealed wafer is provided to therapid temperature-rising-and-falling thermal treatment process of thedevice manufacturing processes in which the conditions are more severethan those of the past RTA process and of which the maximum stressgenerated in the silicon wafer is greater than 20 MPa, it is possible toprevent the deformation. In addition, it is possible to prevent the slipextension resulting from the boat scratches and the transfer scratchescausing the lowering of the wafer strength.

The inventor et al. found conditions to be set at the time of pulling asingle crystal using the Czochralski method as a countermeasure whichcan achieve both the prevention of generation of wafer deformation andthe prevention of generation of a slip in the silicon wafermanufacturing process.

The silicon wafer according to the third aspect of the invention ismanufactured by pulling the silicon single crystal at a high pullingspeed at which the silicon single crystal having void defects can bepulled at the time of pulling the silicon single crystal by the use ofthe Czochralski method.

In the invention, if a silicon single crystal has void defects, it meansthat it includes the V region having defects such as the COP defectswhich may be generated at the time of pulling a crystal, without thegrown-in defects free. That is, this means that it includes the COPgeneration region and it may include the OSF region, the Pv region, andthe Pi region only when it includes the V region.

In the third aspect of the invention, the wafer including the COPdefects means a wafer in which the number of LPDs (Light Point Defects)of 0.09 μm or more is 100 pcs/wf or more.

In the third aspect of the invention, for example, the V/G has only tobe set to 0.22 or more so as to pull a crystal to include the V region.

In the third aspect of the invention, a wafer in which the number ofLPDs with a size of 0.09 μm or more is 100 pcs/wf or more when the LPDdensity is measured by the use of a laser scattering particle counter(SP1 (surfscan SP1) which is a product made by KLA-Tencor Corporation)is employed as the wafer to be subjected to the DZ treatment. That is,the wafer including the COP defects is formed by slicing a pulled ingotdoped with nitrogen and the COP defects are present with theabove-mentioned wafer in-plane density (the number on the entire wafersurface/the wafer area) therein. That is, the wafer including the voiddefects on the entire surface thereof and the wafer partially includingthe OSF-ring region are subjected to the treatment.

In the nitrogen-doped wafer according to the third aspect of theinvention, the OSF-ring region tends to extend to the void region, butmay include the OSF region or the Pv region.

According to the third aspect of the invention, the method ofmanufacturing a silicon wafer which is provided to a semiconductordevice manufacturing process having a thermal treatment process of whichthe highest temperature is equal to or higher than 1050° C. and equal toor lower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec includes:a silicon single crystal pulling process of pulling a straight bodyportion of a silicon single crystal as a region being doped withnitrogen of 1×10¹³ to 5×10¹⁴ atoms/cm³ and having a void defect usingthe Czochralski method; a precipitation, dissolution, and thermaltreatment process of treating a wafer in the atmosphere of non-oxidizinggas not containing nitrogen in the treatment temperature range of 1225°C. to 1350° C., the retention time range of 5 sec to 1 min, and thetemperature-falling rate range of 10° C./sec to 0.1° C./sec; and a DZtreatment process of performing high-temperature annealing treatment ona sliced wafer in the atmosphere of non-oxidizing gas of H₂ and/or Ar at1100° C. or higher for 30 min or more to eliminate the void defect inthe wafer surface layer which is a device forming region after themirror treatment process.

According to the method of manufacturing a silicon wafer, by setting thetemperature condition in the precipitation, dissolution, and thermaltreatment process to be higher than the temperature condition in thestate not containing nitrogen, it is possible to achieve both theprevention of generation of wafer deformation and the prevention ofgeneration of a slip even in the wafer including nitrogen in which theBMDs are easily formed.

In the third aspect of the invention, by using a mixed atmosphere ofnon-oxidizing gas not containing nitrogen and oxygen gas of 1% or moreas the treatment atmosphere in the precipitation, dissolution, andthermal treatment process, it is possible to achieve both the preventionof generation of wafer deformation and the prevention of generation of aslip.

In the method of manufacturing a silicon wafer according to the thirdaspect of the invention, the initial oxygen concentration Oi in thesilicon single crystal pulling process may be set to be in the range of12.0×10¹⁷ to 18×10¹⁷ atoms/cm³ (Old-ASTM). Accordingly, even when theoxygen concentration in the wafer is set to be high by the setting atthe time of pulling, it is also possible to achieve both the preventionof generation of wafer deformation and the prevention of generation of aslip.

The silicon wafer according to the third aspect of the invention ismanufactured by the use of the above-mentioned methods of manufacturinga silicon wafer and the oxygen precipitate density becomes 1×10⁴ pcs/cm²after the thermal treatment at 1000° C. for 16 hours. According to thissilicon wafer, it is possible to achieve both the prevention ofgeneration of the deformation such as a warp of the wafer, which causesthe overlay error shown in FIG. 6, and the prevention of generation ofthe slip dislocation in the edge of the wafer, which is supported asshown in FIG. 5.

<Fourth Aspect>

(D1) A fourth aspect of the invention provides a method of manufacturinga silicon wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature is equal to or higher than 1050° C. and equal to orlower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec, themethod including: a pulling process of pulling a silicon single crystalusing the Czochralski method; and a mirror treatment process of mirrorfinishing a sliced wafer, wherein the pulling process is performed sothat a straight body portion of the silicon single crystal is pulled asa defect-free region not having grown-in defects, a Pv region which is avacancy-dominant defect-free region distributed concentrically in theouter peripheral edge of a wafer obtained by slicing the silicon singlecrystal is not present in a region within 20 mm in the diameterdirection from the outer peripheral edge of the wafer to the center ofthe wafer, and the other region includes a Pi region which is aninterstitial-silicon-dominant defect-free region.

(D2) In the method of manufacturing a silicon wafer described in (D1),the pulling process may be performed so that the entire surface of thewafer includes the Pi region which is the interstitial-silicon-dominantdefect-free region.

(D3) In the method of manufacturing a silicon wafer described in (D1) or(D2), pulling conditions in the pulling process may be set so that theoxygen precipitate density in the Pi region which is theinterstitial-silicon-dominant defect-free region is equal to or lessthan 1×10¹⁴ pcs/cm² after performing thermal treatment at 800° C. for 4hours and thermal treatment at 1000° C. for 16 hours.

(D4) In the method of manufacturing a silicon wafer described in any oneof (D1) to (D3), the initial oxygen concentration Oi in the pullingprocess may be set to be in the range of 12.0×10¹⁷ to 14×10¹⁷ atoms/cm³(Old-ASTM).

(D5) A silicon wafer according to the fourth aspect of the invention ismanufactured by the method of manufacturing a silicon wafer described inany one of (D1) to (D3).

According to the fourth aspect of the invention, the method ofmanufacturing a silicon wafer which is provided to a semiconductordevice manufacturing process having a thermal treatment process of whichthe highest temperature is equal to or higher than 1050° C. and equal toor lower than the melting point of silicon and of which the temperaturerising and falling rate is equal to or higher than 150° C./sec includes:a pulling process of pulling a silicon single crystal using theCzochralski method; and a mirror treatment process of mirror finishing asliced wafer. Here, the pulling process is performed so that a straightbody portion of the silicon single crystal is pulled as a defect-freeregion not having grown-in defects, a Pv region which is avacancy-dominant defect-free region distributed concentrically in theouter peripheral edge of a wafer obtained by slicing the silicon singlecrystal is not present in a region within 20 mm in the diameterdirection from the outer peripheral edge of the wafer to the center ofthe wafer, and the other region includes a Pi region which is aninterstitial-silicon-dominant defect-free region.

In the method of manufacturing a silicon wafer according to the fourthaspect, it is possible to suppress the slip extension in the outerperipheral edge by excluding the Pv region. Since the defect-free regionis provided, the precipitates are not formed in the outer peripheraledge of the wafer in the device processes. Therefore, it is possible tomanufacture a wafer having excellent slip resistance without performingthe precipitation, dissolution, and thermal treatment process used todissolve the oxygen precipitation nuclei causing the deformation.Accordingly, even when the wafer obtained by the use of themanufacturing method according to this aspect is provided to the rapidtemperature-rising-and-falling thermal treatment process of the devicemanufacturing processes of which the conditions are more severe thanthose in the past RTA process and are severe conditions in which thehighest temperature is in the range of 1050° C. to the melting point ofsilicon, the temperature rising and falling rate is in the range of 150°C./sec to 10000° C./sec, preferably in the range of 500° C./sec to 3000°C./sec, and more preferably in the range of 1000° C./sec to 2000°C./sec, and the maximum stress generated in the silicon wafer is greaterthan 20 Mpa, it is possible to prevent the deformation of the wafer. Inaddition, it is also possible to provide a silicon wafer which canprevent the slip extension resulting from boat scratches and transferscratches causing the lowering of the wafer strength.

The inventor et al. found conditions to be set at the time of pulling asingle crystal using the Czochralski method as a countermeasure whichcan achieve both the prevention of generation of wafer deformation andthe prevention of generation of a slip in the silicon wafermanufacturing process.

The silicon single crystal used for the silicon wafer according to thefourth aspect of the invention is pulled at a pulling speed at which asilicon single crystal with grown-in defects free can be pulled at thetime of pulling the silicon single crystal using the Czochralski method.

The “grown-in defects are free” in the invention means that all defectswhich may be generated at the time of pulling a crystal, such as COPdefects or dislocation clusters, are excluded, the OSF region can beexcluded, and the Pv region and the Pi region are included.

When the silicon single crystal used in the silicon wafer according tothe fourth aspect of the invention is pulled by the use of theCzochralski method, a hydrogen-containing material having a partialpressure in terms of hydrogen gas in the range of 40 Pa to 400 Pa isintroduced into the atmosphere gas in the CZ furnace and the siliconsingle crystal pulling speed is set to a speed at which a silicon singlecrystal with grown-in defects free can be pulled. The atmospherecontaining only the inert gas and not containing hydrogen gas may beemployed.

Similarly to the hydrogen-containing material described in the secondaspect, the hydrogen-containing material is a material containing ahydrogen atom in its molecule and is a gaseous material which isthermally decomposed to generate hydrogen gas when it is melted in thesilicon melt.

In the method of manufacturing a silicon single crystal wafer accordingto the fourth aspect of the invention, the allowable range of the speedat which the silicon single crystal with grown-in defects free can bepulled can be widened by introducing the hydrogen-containing materialinto the atmosphere so that the partial pressure in terms of hydrogengas is in the range of 40 Pa to 400 Pa. That is, it is possible toenlarge the pulling speed margin and thus to easily manufacture a waferincluding the Pv and Pi regions and excluding the COP defects and thedislocation clusters in the entire region in the crystal diameterdirection.

In the fourth aspect of the invention, it is preferable that the ingotis pulled so that the Pv region is not present in the region within 20mm in the diameter direction from the outer peripheral edge of the wafertoward the center of the wafer and the other region includes the Piregion. For this purpose, for example, the V/G in the pulling atmospherenot containing hydrogen can be set to be in the range of 0.20 to 0.15(mm²)/(° C.min).

In the fourth aspect of the invention, it is preferable that the pullingprocess is performed so that the entire surface of the wafer includesthe Pi region which is the interstitial-silicon-dominant defect-freeregion. In the wafer manufacturing method according to the fourthaspect, it is possible to manufacture a wafer which can prevent theoxygen precipitates from being formed in the outer peripheral edge,prevent the deformation resulting from the precipitates on the entirewafer surface, and prevent the generation of a slip.

In the fourth aspect of the invention, it is preferable that pullingconditions in the pulling process are set so that the oxygen precipitatedensity in the Pi region which is the interstitial-silicon-dominantdefect-free region is equal to or less than 1×10¹⁴ pcs/cm² afterperforming thermal treatment at 800° C. for 4 hours and thermaltreatment at 1000° C. for 16 hours. In the wafer manufacturing methodaccording to the fourth aspect, it is possible to achieve both theprevention of generation of wafer deformation and the prevention ofgeneration of a slip.

In the method of manufacturing a silicon wafer according to the fourthaspect of the invention, the initial oxygen concentration Oi in thesilicon single crystal pulling process may be set to be in the range of12.0×10¹⁷ to 14×10¹⁷ atoms/cm³ (Old-ASTM). In the wafer manufacturingmethod according to the fourth aspect, even when the wafer has a highoxygen concentration by the setting at the time of pulling, it is alsopossible to achieve both the prevention of generation of waferdeformation and the prevention of generation of a slip.

The silicon wafer according to the fourth aspect of the invention ismanufactured by the use of the above-mentioned methods of manufacturinga silicon wafer. By employing the wafer according to the fourth aspect,it is possible to achieve both the prevention of generation of thedeformation such as a warp of the wafer, which causes the overlay errorshown in FIG. 6, and the prevention of generation of the slipdislocation in the edge of the wafer, which is supported as shown inFIG. 5.

In the wafers or the manufacturing processes related to the devicemanufacturing according to the first aspect, the second aspect, thethird aspect, and the fourth aspect, the deformation such as a warp of awafer and the slip dislocation in the edge can be determined on thebasis of slip lengths. Specifically, as described later, the slip lengthof 0.5 to 2 mm is evaluated as O (A: Good), the slip length of 2 to 5 mmis evaluated as Δ (B: Acceptable), and the slip length of 5 to 10 mm isevaluated as X (C: Not Acceptable).

Advantageous Effects of Invention

According to the first aspect, the second aspect, the third aspect, andthe fourth aspect of the invention, even when the wafer is provided tothe rapid temperature-rising-and-falling thermal treatment process ofthe device manufacturing processes of which the conditions are moresevere than those in the past RTA process and the maximum stressgenerated in the silicon wafer is greater than 20 Mpa, it is possible toprovide a silicon wafer or a silicon epitaxial wafer which can reducethe oxygen precipitates to prevent the deformation of the wafer. Inaddition, it is also possible to provide a silicon wafer which canprevent the slip extension resulting from boat scratches and transferscratches causing the lowering of the wafer strength.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a flowchart illustrating a method of manufacturing a siliconepitaxial wafer according to a first aspect of the invention.

FIG. 2 is a sectional view schematically illustrating a part of an RTAapparatus.

FIG. 3 is a sectional view schematically illustrating a MOS FET.

FIG. 4 is a graph illustrating a box-like dopant profile in therelationship between the dopant concentration and the junction depth.

FIG. 5 is a sectional view of a work stage in a past exposing apparatus.

FIG. 6 is a plan view illustrating overlay errors.

FIG. 7 is a graph illustrating the relationship between the BMD densityand the maximum shift due to the generation of a slip.

FIG. 8 is a diagram illustrating a state where slip dislocations aregenerated in a wafer edge through the use of X-ray topography.

FIG. 9 is an enlarged sectional view illustrating an edge of a siliconwafer according to the invention.

FIG. 10 is a flowchart illustrating a method of manufacturing a siliconwafer according to a second aspect of the invention.

FIG. 11 is a schematic longitudinal sectional view of a CZ furnace usedto perform the methods of manufacturing a silicon wafer according to thefirst to fourth aspects of the invention.

FIG. 12 is a flowchart illustrating a method of manufacturing a siliconwafer according to a third aspect of the invention.

FIG. 13 is a flowchart illustrating a method of manufacturing a siliconwafer according to a fourth aspect of the invention.

BEST MODE FOR CARRYING OUT THE INVENTION First Embodiment

Hereinafter, a silicon epitaxial wafer and a manufacturing methodthereof according to a first embodiment of the invention will bedescribed with reference to the accompanying drawings.

FIG. 1 is a flowchart illustrating a manufacturing method of a siliconepitaxial wafer according to the first embodiment of the invention.

The method of manufacturing a silicon epitaxial wafer according to thefirst embodiment includes a manufacturing condition setting process S10,a wafer preparing process S111, a setting process S112 of settingconditions in a precipitation, dissolution, and thermal treatmentprocess, an epitaxial process S12, and a precipitation, dissolution, andthermal treatment process S13, as shown in FIG. 1. The manufacturedsilicon epitaxial wafer is provided to a device manufacturing processS15 including a rapid temperature-rising-and-falling thermal treatmentprocess S152.

In the manufacturing condition setting process S10 shown in FIG. 1, thestandards of a wafer provided to the device manufacturing process S15 orthe conditions at the time of pulling a silicon single crystal from asilicon melt by the use of the CZ (Czochralski) method in the waferpreparing process S111 are set.

In the manufacturing condition setting process S10, the oxygenconcentration Oi of a silicon wafer (substrate) serving as a parameterto be controlled at the time of pulling and the boron concentration andthe nitrogen concentration as the dopant concentrations are set asprocess requirements in the wafer preparing process S111.

The wafer preparing process S111 is a process of preparing a siliconwafer on which an epitaxial layer is formed. In the wafer preparingprocess S111, a single crystal is pulled by the use of the CZ method,the pulled silicon single crystal ingot is sliced to form a wafer, andthe wafer is subjected to surface treatment such as chamfering,grinding, polishing, and cleaning. The diameter of the silicon wafer maybe in the range of 300 mm to 450 mm.

The setting process S112 shown in FIG. 1 is a process of settingprocessing conditions in the precipitation, dissolution, and thermaltreatment process S13 so as to suppress the generation of a waferdeformation and the generation of a slip in the rapidtemperature-rising-and-falling thermal treatment process S152.

The surface of the silicon wafer prepared in the wafer preparing processS111 is made to epitaxially grow through the use of the epitaxialprocess S12. The resultant silicon epitaxial wafer is provided to thedevice manufacturing process S15. The device manufacturing process S15includes the rapid temperature-rising-and-falling thermal treatmentprocess S152 such as the FLA process. In the setting process S112, thestress generated in the wafer in the rapidtemperature-rising-and-falling thermal treatment process S152 and theoxygen precipitation required for the stress are set to desired states.In the device manufacturing process S15, the thermal treatment providedwith the silicon wafer is the rapid temperature-rising-and-fallingthermal treatment process S152 in which the temperature rising andfalling rate is 150° C./sec or higher in the highest temperature rangeof 1050° C. to the melting point of silicon. The treatment conditions inthe precipitation, dissolution, and thermal treatment process S13 aredetermined in the setting process S112 so that a pattern formed in apre-photolithography process S151 and a pattern formed in apost-photolithography process S153 before and after the rapidtemperature-rising-and-falling thermal treatment process S152 are notmisaligned to cause the overlay error, whereby the generation of adeformation and the generation of a slip are suppressed in the rapidtemperature-rising-and-falling thermal treatment process S152. In thesetting process S112, the order of the precipitation, dissolution, andthermal treatment process S13 and the epitaxial process S12 is also set.At this time, the precipitation, dissolution, and thermal treatmentprocess S13 may not be performed. That is, in the setting process S112,the conditions in the precipitation, dissolution, and thermal treatmentprocess S13 are determined in consideration of the conditions in themanufacturing condition setting process S10 and the conditions in therapid temperature-rising-and-falling thermal treatment process S152.

The followings can be selected as the conditions in the manufacturingcondition setting process S10 and the setting process S112.

In the manufacturing condition setting process S10, boron is doped sothat the resistivity is in the range of 0.02 Ωcm to 1 kΩcm and theinitial oxygen concentration Oi is set to be in the range of 14.0×10¹⁷to 22×10¹⁷ atoms/cm³ (Old-ASTM). In the setting process S112, thetreatment temperature is set to be in the range of 1150° C. to 1300° C.,the retention time is set to be in the range of 5 sec to 1 min, and thetemperature-falling rate is set to be in the range of 10° C./sec to 0.1°C./sec. At this time, the initial oxygen concentration Oi has only to bein the range of 15.0×10¹⁷ to 20×10¹⁷ atoms/cm³. Preferably, thetreatment temperature is set to be in the range of 1175° C. to 1250° C.,the retention time is set to be in the range of 10 sec to 30 sec, andthe temperature-falling rate is set to be in the range of 8° C./sec to0.5° C./sec.

In the manufacturing condition setting process S10, nitrogen of 1×10¹³to 5×10¹⁴ atoms/cm³ is doped. In the setting process S112, theprecipitation, dissolution, and thermal treatment process S13 is set tobe performed after the epitaxial process S12, the treatment temperatureis set to be in the range of 1200° C. to 1300° C., the retention time isset to be in the range of 5 sec to 1 min, and the temperature-fallingrate is set to be in the range of 10° C./sec to 0.1° C./sec. Preferably,the treatment temperature is set to be in the range of 1225° C. to 1275°C., the retention time is set to be in the range of 10 sec to 30 sec,and the temperature-falling rate is set to be in the range of 8° C./secto 0.5° C./sec.

In the manufacturing condition setting process S10, boron is doped sothat the resistivity is in the range of 0.02 Ωcm to 0.001 Ωcm and theinitial oxygen concentration Oi is set to be in the range of 11.0×10¹⁷to 3×10¹⁷ atoms/cm³ (Old-ASTM). In the setting step S112, theprecipitation, dissolution, and thermal treatment process S13 is set notto be performed. More preferably, the initial oxygen concentration Oi isset to be in the range of 10×10¹⁷ to 5×10¹⁷ atoms/cm³.

In the manufacturing condition setting process S10, boron is doped sothat the resistivity is in the range of 0.02 Ωcm to 0.001 Ωcm and theinitial oxygen concentration Oi is set to be in the range of 11.0×10¹⁷to 18×10¹⁷ atoms/cm³ (Old-ASTM). In the setting process S112, theprecipitation, dissolution, and thermal treatment process S13 is set tobe performed before the epitaxial process S12, the treatment temperatureis set to be in the range of 1150° C. to 1300° C., the retention time isset to be in the range of 5 sec to 1 min, and the temperature-fallingrate is set to be in the range of 10° C./sec to 0.1° C./sec. Preferably,the initial oxygen concentration Oi is set to be in the range of12.0×10¹⁷ to 16×10¹⁷ atoms/cm³. Preferably, the treatment temperature isset to be in the range of 1175° C. to 1275° C., the retention time isset to be in the range of 10 sec to 45 sec, and the temperature-fallingrate is set to be in the range of 8° C./sec to 0.5° C./sec.

In the setting process S112, a non-oxidizing gas atmosphere notcontaining nitrogen is set as the treatment atmosphere in theprecipitation, dissolution, and thermal treatment process S13. A mixedatmosphere of non-oxidizing gas not containing nitrogen and oxygen gasof 1% or more may be used as the treatment atmosphere in theprecipitation, dissolution, and thermal treatment process S13. A mixedatmosphere of non-oxidizing gas not containing nitrogen and oxygen gasof 3% or more may be used as the treatment atmosphere in theprecipitation, dissolution, and thermal treatment process S13 and thetemperature-falling rate may be set to be in the range of 50° C./sec to20° C./sec. The oxygen gas in the mixed atmospheres may be 10% or lessand is preferably 5% or less.

In the epitaxial process S12 shown in FIG. 1, an epitaxial layer isformed on the wafer surface to be of, for example, a p/p-type. Thismeans a wafer in which a p-type epitaxial layer with a thickness of 1 to10 μm is stacked on a p-type wafer. Here, the p-type of the boron (B)concentration means a concentration corresponding to the resistivity of0.1 to 100 Ωcm and the p type means a concentration corresponding to theresistivity of 0.1 Ωcm to 100 Ωcm.

The precipitation, dissolution, and thermal treatment process S13 shownin FIG. 1 is performed at a treatment temperature higher than thetreatment temperature in the epitaxial process S12 under theabove-mentioned conditions by an RTA apparatus 10. In the RTA apparatus10, the edge of a wafer W is supported and kept horizontal by aring-like edge ring 11 formed of SiC and disposed in the furnace, asshown in FIG. 2. By heating the wafer W by the use of plural lamps 13via an upper dome 12 formed of transparent quartz or the like in theatmosphere of the above-mentioned atmosphere gas G, sources serving asprecipitation nuclei in the wafer W are dissolved. The lamps 13 in theRTA apparatus 10 are disposed in reflectors 14 of which the surface isplated with gold or the like, respectively. The upper dome 12 and alower dome (not shown) are connected to each other by a wall 15 formedof SUS (stainless steel) and a chamber (furnace) is constructed thereby.

In the device manufacturing process S15 shown in FIG. 1, processesnecessary for forming devices based on the 65 nm node or the 45 nm nodeon the silicon wafer are performed. The device manufacturing process S15includes the rapid temperature-rising-and-falling thermal treatmentprocess S152 such as a spike-RTA process or an FLA process.

In the pre-photolithography process S151 and the post-photolithographyprocess S153 shown in FIG. 1, as shown in FIG. 5, a wafer 21 issupported and fixed onto a work stage 22 by vacuum suction, a photomask23 is supported and fixed onto a mask holder 24 above the work stage 22.Thereafter, the work stage 22 is lifted up to bring the thin wafer 21into close contact with the photomask 23, and then the wafer is exposed.A photoresist film (not shown) is formed on the surface of the wafer 21in advance and the photoresist film is exposed to bake a pattern of thephotomask 23.

In the method of manufacturing a silicon epitaxial wafer according tothe first embodiment, in the setting process S112, the conditions in theprecipitation, dissolution, and thermal treatment process S13 aredetermined in consideration of the conditions in the manufacturingcondition setting process S10 and the conditions in the rapidtemperature-rising-and-falling thermal treatment process S152. Theprocesses are performed on the basis of the determined conditions.Therefore, in the silicon epitaxial wafer according to the firstembodiment, precipitates with a density and a size greater than 5×10⁴pcs/cm² which causes the slip dislocation in the wafer are not formed.Accordingly, as shown in FIG. 5, even when the wafer 21 is supported andfixed onto the work stage 22 by vacuum suction, the maximum shift shownin FIG. 7 and resulting from the precipitates is not greater than 10 nmwhich is the allowable reference. That is, the deformation of a warpcausing the overlay error shown in FIG. 6 is not generated.

In addition, in the silicon epitaxial wafer according to the firstembodiment, it is possible to prevent the slip dislocation from beinggenerated in the edge of the wafer W supported as shown in FIG. 8 andthus to prevent the strength of the wafer from being lowered.

When the spike-RTA process is performed as the rapidtemperature-rising-and-falling thermal treatment process S152, theconditions can be set and the process can be performed by the use of theRTA apparatus 10 shown in FIG. 2.

Second Embodiment

Hereinafter, a silicon wafer and a manufacturing method thereofaccording to a second embodiment of the invention will be described withreference to the accompanying drawings.

FIG. 10 is a flowchart illustrating a silicon wafer and a manufacturingmethod thereof according to this embodiment.

The method of manufacturing a silicon wafer according to the secondembodiment includes a manufacturing condition setting process S20, awafer preparing process S211 including a pulling process, a polishingprocess S212, and a precipitation, dissolution, and thermal treatmentprocess S23, as shown in FIG. 10. The silicon wafer manufactured throughthe precipitation, dissolution, and thermal treatment process S23 isprovided to a device manufacturing process S25 including a rapidtemperature-rising-and-falling thermal treatment process S252.

In the manufacturing condition setting process S20 shown in FIG. 10, thestandards of a wafer provided to the device manufacturing process S25,the conditions at the time of pulling a silicon single crystal from asilicon melt by the use of the CZ (Czochralski) method in the waferpreparing process S211, and the conditions in the precipitation,dissolution, and thermal treatment process S23 are set. A stress isgenerated in the wafer depending on the conditions in the rapidtemperature-rising-and-falling thermal treatment process S252 such as anFLA process of the semiconductor device manufacturing process S25 whichis a subsequent process provided with the wafer. To prevent thegeneration of the stress, there is an oxygen precipitation staterequired for coping with the stress. In the manufacturing conditionsetting process S20, the conditions in the precipitation, dissolution,and thermal treatment process S23 are determined to set the oxygenprecipitation state to a desired state. In the device manufacturingprocess S25, the thermal treatment provided with the silicon wafer isthe rapid temperature-rising-and-falling thermal treatment process S252in which the treatment time is set to be in the range of 1 μsec to 100msec in the highest temperature range of 1100° C. to the melting pointof silicon. The conditions for suppressing the generation of adeformation and the generation of a slip in the rapidtemperature-rising-and-falling thermal treatment process S252 aredetermined in the manufacturing condition setting process S20 so that apattern formed in a pre-photolithography process S251 and a patternformed in a post-photolithography process S253 before and after therapid temperature-rising-and-falling thermal treatment process S252 arenot misaligned to cause the overlay error.

In the manufacturing condition setting process S20, the ratio of thepulling speed V and the temperature gradient G from the solid-liquidinterface serving as a parameter to be controlled at the time ofpulling, that is, the value of V/G, the oxygen concentration Oi of asilicon wafer (substrate), and the dopant concentrations are set asprocess requirements in the wafer preparing process S211.

In the wafer preparing process S211, a single crystal is pulled by theuse of the CZ method by the use of a CZ furnace, the pulled siliconsingle crystal ingot is sliced to form a wafer, and the wafer issubjected to surface treatment such as chamfering, grinding, andcleaning. Thereafter, the silicon wafer is provided to the polishingprocess S212 as a finishing process. The diameter of the silicon wafermay be in the range of 300 mm to 450 mm.

FIG. 11 is a longitudinal sectional view of a CZ furnace suitably usedto perform the methods of manufacturing a silicon wafer according to theembodiments of the invention.

The CZ furnace shown in FIG. 11 includes a crucible 1 disposed at thecenter of a chamber, a heater 2 disposed outside of the crucible 1, anda magnetic field supply device 9 disposed outside the heater 2. Thecrucible 1 has a double structure in which a quartz crucible 1 acontaining a silicon melt 3 therein is supported by a graphite crucible1 b disposed outside and is driven to rotate and to move up and down bya support shaft 1 c called pedestal.

A cylindrical heat insulating member 7 is disposed above the crucible 1.The heat insulating member 7 has a structure in which a shell formed ofgraphite is filled with graphite felt. The inner surface of the heatinsulating member 7 is tapered so that the inner diameter graduallydecreases from the top to the bottom. The upper outer surface of theheat insulating member 7 is tapered to correspond to the inner surfaceand the lower outer surface thereof is formed straight so that thethickness of the heat insulating member 7 gradually increases to thebottom.

A seed crystal T disposed on a seed chuck 5 is immersed in the siliconmelt 3 and the seed crystal T is pulled while rotating the crucible 1and a pulling shaft 4, whereby a silicon single crystal 6 can be formed.

The heat insulating member 7 serves to insulate radiant heat from theheater 2 and the silicon melt 3 to the side surface of the siliconsingle crystal, surrounds the side surface of the silicon single crystal6 in pulling and the surface of the silicon melt 3. The specification ofthe heat insulating member 7 is as follows. The width W in the radialdirection is, for example, 50 mm, the slope θ of the inner surface,which is an inverted truncated cone surface, about the verticaldirection is, for example, 21°, and the height H1 of the bottom of theheat insulating member 7 from the melt surface is, for example, 60 mm. Ahorizontal magnetic field or a cusp magnetic field may be employed asthe magnetic field to be applied from the magnetic field supply device9. For example, the intensity of the horizontal magnetic field is in therange of 2000 to 4000 G (0.2 T to 0.4 T) and preferably in the range of2500 to 3500 G (0.25 T to 0.35 T). The magnetic field center height isset to be in the range of −150 mm to +100 mm with respect to the meltsurface and more preferably to the range of −75 mm to +50 mm.

In the wafer preparing process S211, first, 100 kg of high-puritypolycrystalline silicon is input to the crucible 1 shown in FIG. 11 andnecessary dopants are also input thereto to adjust the dopantconcentrations in the polycrystalline silicon. Then, the inside of theCZ furnace is set to a hydrogen-containing atmosphere including mixedgas of a hydrogen-containing material and inert gas, the pressure of theatmosphere is set to be in the range of 1.3 to 13.3 kPa (10 to 100Torr), and the concentration of the hydrogen-containing material in theatmosphere gas is adjusted so that the partial pressure thereof in termsof hydrogen gas is in the range of 40 to 400 Pa. When hydrogen gas isselected as the hydrogen-containing material, the partial pressure ofthe hydrogen gas can be set to be in the range of 40 to 400 Pa. Theconcentration of the hydrogen gas is in the range of 0.3% to 31%.

The atmosphere may include only the inert gas not containing thehydrogen gas.

When the partial pressure of the hydrogen-containing material in termsof hydrogen gas is less than 40 Pa, the allowable range of the pullingspeed is reduced and thus the generation of COP defects and dislocationclusters cannot be suppressed, which is not preferable. As theconcentration of the hydrogen-containing material in terms of hydrogengas (the concentration of hydrogen) increases, the dislocationsuppressing effect increases. However, when the partial pressure interms of hydrogen gas is greater than 400 Pa, the possibility ofexplosion increases at the time of causing oxygen to leak into the CZfurnace, which is not preferable in terms of safety. The partialpressure of the hydrogen-containing material in terms of hydrogen gas ismore preferably in the range of 40 Pa to 250 Pa and still morepreferably in the range of 40 Pa to 135 Pa.

The horizontal magnetic field of, for example, 3000 G (0.3 T) issupplied from the magnetic field supply device 9 so that the magneticfield center height is in the range of −75 to +50 mm with respect to themelt surface, and the polycrystalline silicon is heated by the heater 2to form the silicon melt 3.

The seed crystal T mounted on the seed chuck 5 is immersed in thesilicon melt 3 and the crystal pulling is performed while rotating thecrucible 1 and the pulling shaft 4.

At this time, an example of the pulling condition is a condition thatwhen the growing speed of the single crystal is V (mm/min) and thetemperature gradient from the melting point to 1350° C. at the time ofgrowth of the single crystal is G (° C./mm), the ratio V/G (mm²/min° C.)is controlled to be in the range of 0.22 to 0.15 and V is controlled tobe in the mage of 0.65 via 0.42 to 0.33 mm/min at which the siliconsingle crystal with grown-in defects free can be pulled.

Another example of the pulling condition is a condition that the numberof rotations of the quartz crucible is set to be in the range of 5 to0.2 rpm, the number of rotations of the single crystal is set to be inthe range of 20 to 10 rpm, the pressure of the argon atmosphere is setto 30 Torr, and the intensity of the magnetic field is set to 3000Gauss. Particularly, by setting the number of rotations of the quartzcrucible to 5 rpm or less, it is possible to prevent oxygen atomsincluded in the quartz crucible from diffusing into the silicon melt andto reduce the interstitial oxygen concentration in the silicon singlecrystal. Another example of the pulling condition is a condition thatthe number of rotations of the quartz crucible is set to 0.2 rpm orless, the number of rotations of the single crystal is set to 5 rpm orless, the pressure of the argon atmosphere is set to be in the range of1333 to 26660 Pa, and the intensity of the magnetic field is set to bein the range of 3000 to 5000 Gauss. The number of rotations of thesingle crystal may be set to 15 rpm or more.

The manufacturing condition setting process S20 shown in FIG. 10 can beperformed as follows.

In the manufacturing condition setting process S20, such conditions areselected that boron is doped so that the resistivity is in the range of0.001 Ωcm to 1 kΩcm, the initial oxygen concentration Oi is set to be inthe range of 12.0×10¹⁷ to 20×10¹⁷ atoms/cm³ (Old-ASTM), and the siliconcrystal includes a region in which the Pv region and the Pi region aredistributed but does not include the OSF region. In the manufacturingcondition setting process S20, as the conditions of the precipitation,dissolution, and thermal treatment process S23, the treatmenttemperature is set to be in the range of 950° C. to 1200° C., theretention time is set to be in the range of 5 sec to 1 min, thetemperature-falling rate is set to be in the range of 10° C./sec to 0.1°C./sec, and the atmosphere is set to the atmosphere of non-oxidizing gasnot containing nitrogen or the mixed atmosphere of non-oxidizing gas notcontaining nitrogen and oxygen gas of 3% or more. Preferably, theinitial oxygen concentration Oi is set to be in the range of 13×10¹⁷ to18×10¹⁷ atoms/cm³. Preferably, the treatment temperature is set to be inthe range of 1000° C. to 1175° C., the retention time is set to be inthe range of 10 sec to 45 sec, the temperature-falling rate is set to bein the range of 8° C./sec to 0.5° C./sec, and the oxygen gasconcentration is set to be in the range of 3.5% to 10%.

In the manufacturing condition setting process S20, such conditions areselected that boron is doped so that the resistivity is in the range of0.001 Ωcm to 1 kΩcm, the initial oxygen concentration Oi is set to be inthe range of 12.0×10¹⁷ to 20×10¹⁷ atoms/cm³ (Old-ASTM), and the siliconcrystal includes the Pv region, the Pi region, and the OSF region. Inthe manufacturing condition setting process S20, as the conditions ofthe precipitation, dissolution, and thermal treatment process S23, thetreatment temperature is set to be in the range of 1225° C. to 1350° C.,the retention time is set to be in the range of 5 sec to 1 min, thetemperature-falling rate is set to be in the range of 10° C./sec to 0.1°C./sec, and the atmosphere is set to the atmosphere of non-oxidizing gasnot containing nitrogen or the mixed atmosphere of non-oxidizing gas notcontaining nitrogen and oxygen gas of 3% or more. Preferably, theinitial oxygen concentration Oi is set to be in the range of 12.5×10¹⁷to 18×10¹⁷ atoms/cm³. Preferably, the treatment temperature is set to bein the range of 1250° C. to 1325° C., the retention time is set to be inthe range of 10 sec to 45 sec, the temperature-falling rate is set to bein the range of 8° C./sec to 0.5° C./sec, and the oxygen gasconcentration is set to be in the range of 3.5% to 10%.

The precipitation, dissolution, and thermal treatment process S23 shownin FIG. 10 is performed under the above-mentioned conditions by the RTAapparatus 10. The RTA apparatus 10 is the RTA apparatus 10 shown in FIG.2 in the first embodiment.

In the device manufacturing process S25 shown in FIG. 10, processesnecessary for forming devices based on the 45 nm node (hp65) on thesilicon wafer are performed. The device manufacturing process S25includes the rapid temperature-rising-and-falling thermal treatmentprocess S252 such as a spike-RTA process or an FLA process.

In the pre-photolithography process S251 and the post-photolithographyprocess S253 shown in FIG. 10, as shown in FIG. 5, a wafer 21 issupported and fixed onto a work stage 22 by vacuum suction, a photomask23 is supported and fixed onto a mask holder 24 above the work stage 22.Thereafter, the work stage 22 is lifted up to bring the thin wafer 21into close contact with the photomask 23, and then the wafer is exposed.A photoresist film (not shown) is formed on the surface of the wafer 21in advance and the photoresist film is exposed to bake a pattern of thephotomask 23.

In the method of manufacturing a silicon wafer according to the secondembodiment, in the manufacturing condition setting process S20, thepulling conditions in the wafer preparing process S211 and the treatmentconditions in the precipitation, dissolution, and thermal treatmentprocess S23 are determined in consideration of the conditions in therapid temperature-rising-and-falling thermal treatment process S252. Theprocesses are performed on the basis of the determined conditions.Therefore, in the silicon wafer W according to the second embodiment,precipitates with a density and a size greater than 5×10⁴ pcs/cm² whichcauses the slip dislocation in the wafer are not formed. Accordingly, asshown in FIG. 5, even when the wafer 21 is supported and fixed onto thework stage 22 by vacuum suction, the maximum shift shown in FIG. 7 andresulting from the precipitates is not greater than 10 nm which is theallowable reference. That is, the deformation of a warp causing theoverlay error shown in FIG. 6 is not generated.

In addition, in the silicon wafer according to the second embodiment, itis possible to prevent the slip dislocation from being generated in theedge of the wafer supported as shown in FIG. 8 and thus to prevent thestrength of the wafer from being lowered.

When the spike-RTA process is performed as the rapidtemperature-rising-and-falling thermal treatment process S252, theconditions can be set and the process can be performed by the use of theRTA apparatus 10 shown in FIG. 2.

Third Embodiment

Hereinafter, a silicon wafer and a manufacturing method thereofaccording to a third embodiment of the invention will be described withreference to the accompanying drawings.

FIG. 12 is a flowchart illustrating a manufacturing method of a siliconwafer according to this embodiment.

The method of manufacturing a silicon wafer according to this embodimentincludes a manufacturing condition setting process S30, a waferpreparing process S311 including a pulling process, a precipitation,dissolution, and thermal treatment process S33, and a DZ treatmentprocess S313, as shown in FIG. 12. The silicon wafer manufacturedthrough the precipitation, dissolution, and thermal treatment processS33 is provided to a device manufacturing process S35 including a rapidtemperature-rising-and-falling thermal treatment process S352.

In the manufacturing condition setting process S30 shown in FIG. 12, thestandards of a wafer provided to the device manufacturing process S35,the conditions at the time of pulling a silicon single crystal from asilicon melt by the use of the CZ (Czochralski) method in the waferpreparing process S311, the conditions in the DZ treatment process S313,and the conditions in the precipitation, dissolution, and thermaltreatment process S33 based on the above-mentioned conditions are set. Astress is generated in the wafer depending on the conditions in therapid temperature-rising-and-falling thermal treatment process S352 suchas an FLA process of the semiconductor device manufacturing process S35which is a subsequent process provided with the wafer. To prevent thegeneration of the stress, there is an oxygen precipitation staterequired for coping with the stress. In the manufacturing conditionsetting process S30, the conditions in the precipitation, dissolution,and thermal treatment process S33 are determined to set the oxygenprecipitation state to a desired state. In the device manufacturingprocess S35, the thermal treatment provided with the silicon wafer isthe rapid temperature-rising-and-falling thermal treatment process S352in which the treatment time is set to be in the range of 1 μsec to 100msec in the highest temperature range of 1100° C. to the melting pointof silicon. The conditions for suppressing the generation of adeformation and the generation of a slip in the rapidtemperature-rising-and-falling thermal treatment process S352 aredetermined in the manufacturing condition setting process S30 so that apattern formed in a pre-photolithography process S351 and a patternformed in a post-photolithography process S353 before and after therapid temperature-rising-and-falling thermal treatment process S352 arenot misaligned to cause the overlay error.

In the manufacturing condition setting process S30, the ratio of thepulling speed V and the temperature gradient G from the solid-liquidinterface serving as a parameter to be controlled at the time ofpulling, that is, the value of V/G, the oxygen concentration Oi of asilicon wafer (substrate), and the dopant concentrations are set asprocess requirements in the wafer preparing process S311.

In the wafer preparing process S311, a single crystal is pulled by theuse of the CZ method by the use of a CZ furnace, the pulled siliconsingle crystal ingot is sliced to form a wafer, and the wafer issubjected to surface treatment such as chamfering, grinding, polishing,and cleaning to prepare a silicon wafer. The diameter of the siliconwafer may be in the range of 300 mm to 450 mm.

The CZ furnace shown in FIG. 11 in the second embodiment is used tomanufacture a silicon wafer in the wafer preparing process S311.

In the wafer preparing process S311, first, 100 kg of high-puritypolycrystalline silicon is input to the crucible 1 shown in FIG. 11 andnecessary dopants are also input thereto to adjust the dopantconcentrations in the polycrystalline silicon.

Then, the inside of the CZ furnace is set to a predetermined atmosphereof inert gas or the like and the pressure thereof is adjusted.

The horizontal magnetic field of, for example, 3000 G (0.3 T) issupplied from the magnetic field supply device 9 so that the magneticfield center height is in the range of −75 to +50 mm with respect to themelt surface, and the polycrystalline silicon is heated by the heater 2to form the silicon melt 3.

The seed crystal T mounted on the seed chuck 5 is immersed in thesilicon melt 3 and the crystal pulling is performed while rotating thecrucible 1 and the pulling shaft 4.

At this time, an example of the pulling condition is a condition thatwhen the growing speed of the single crystal is V (mm/min) and thetemperature gradient from the melting point to 1350° C. at the time ofgrowth of the single crystal is G (° C./mm), the ratio V/G (mm²/min° C.)is controlled to be in the range of 0.22 to 0.15 and V is controlled tobe in the range of 0.65 via 0.42 to 0.33 mm/min at which the siliconsingle crystal including the V region having the void defects presenttherein can be pulled.

Another example of the pulling condition is a condition that the numberof rotations of the quartz crucible is set to be in the range of 5 to0.2 rpm, the number of rotations of the single crystal is set to be inthe range of 20 to 10 rpm, the pressure of the argon atmosphere is setto 30 Torr, and the intensity of the magnetic field is set to 3000Gauss. The intensity of the magnetic field may be set to be in the rangeof 3000 to 5000 Gauss. The number of rotations of the single crystal maybe set to 15 rpm or more.

The manufacturing condition setting process S30 shown in FIG. 12 can beperformed as follows.

In the manufacturing condition setting process S30, as the conditions inthe pulling process, boron is doped so that the resistivity is in therange of 0.001 Ωcm to 1 kΩcm, the initial oxygen concentration Oi is setto be in the range of 12.0×10¹⁷ to 18×10¹⁷ atoms/cm³ (Old-ASTM), and thepulling speed is set to cause the void defects to be present. As theconditions in the DZ treatment process S313, the atmosphere is set to anon-oxidizing atmosphere including H₂ or Ar, the treatment temperatureis set to be in the range of 1150° C. to 1300° C., and the treatmenttime is set to be in the range of 30 min to 16 hours. As the conditionsin the precipitation, dissolution, and thermal treatment process S33,the treatment temperature is set to be in the range of 950° C. to 1200°C., the retention time is set to be in the range of 5 sec to 1 min, thetemperature-falling rate is set to be in the range of 10° C./sec to 0.1°C./sec, and the atmosphere is set to the atmosphere of non-oxidizing gasnot containing nitrogen or the mixed atmosphere of non-oxidizing gas notcontaining nitrogen and oxygen gas of 1% or more. At this time, theinitial oxygen concentration Oi is preferably in the range of 12.5×10¹⁷to 17×10¹⁷ atoms/cm³. Preferably, the treatment temperature of the DZtreatment process is set to be in the range of 1175° C. to 1275° C. andthe treatment time thereof is set to be in the range of 40 min to 8hours. Preferably, the treatment temperature of the precipitation,dissolution, and thermal treatment process S33 is set to be in the rangeof 1000° C. to 1175° C., the retention time thereof is set to be in therange of 10 sec to 45 sec, the temperature-falling rate is set to be inthe range of 8° C./sec to 0.5° C./sec, and the oxygen gas concentrationis set to be in the range of 1.5% to 10%.

In the manufacturing condition setting process S30, as the conditions inthe pulling process, boron is doped so that the resistivity is in therange of 0.001 Ωcm to 1 kΩcm, the initial oxygen concentration Oi is setto be in the range of 12.0×10¹⁷ to 18×10¹⁷ atoms/cm³ (Old-ASTM), and thepulling speed is set to cause the void defects to be present. As theconditions in the DZ treatment process S313, the atmosphere is set to anon-oxidizing atmosphere including H₂ or Ar, the treatment temperatureis set to be in the range of 1150° C. to 1300° C., and the treatmenttime is set to be in the range of 30 min to 16 hours. As the conditionsin the precipitation, dissolution, and thermal treatment process S33,the treatment temperature is set to be in the range of 1225° C. to 1350°C., the retention time is set to be in the range of 5 sec to 1 min, thetemperature-falling rate is set to be in the range of 10° C./sec to 0.1°C./sec, and the atmosphere is set to the atmosphere of non-oxidizing gasnot containing nitrogen or the mixed atmosphere of non-oxidizing gas notcontaining 1% or more of nitrogen and oxygen gas. At this time, theinitial oxygen concentration Oi is preferably in the range of 12.5×10¹⁷to 17×10¹⁷ atoms/cm³. Preferably, the treatment temperature of the DZtreatment process is set to be in the range of 1175° C. to 1275° C. andthe treatment time thereof is set to be in the range of 40 min to 8hours. Preferably, the treatment temperature of the precipitation,dissolution, and thermal treatment process S33 is set to be in the rangeof 1250° C. to 1300° C., the retention time thereof is set to be in therange of 5 sec to 30 sec, the temperature-falling rate is set to be inthe range of 8° C./sec to 0.5° C./sec, and the oxygen gas concentrationis set to be in the range of 1.5% to 10%.

The precipitation, dissolution, and thermal treatment process S33 shownin FIG. 12 is performed as the pre-process of the DZ treatment processS313 under the above-mentioned conditions by the RTA apparatus 10. TheRTA apparatus 10 is the RTA apparatus 10 shown in FIG. 2 in the firstembodiment.

The DZ treatment process S313 shown in FIG. 12 is performed, forexample, by a vertical batch furnace. In the DZ treatment process S313,by performing a high-temperature annealing process on the wafersubjected to the precipitation, dissolution, and thermal treatmentprocess S33 in the non-oxidizing atmosphere of H₂ or Ar at 1150° C. orhigher for 30 min or more, the void defects in the surface of the waferwhich is a device forming area are eliminated.

When the silicon wafer having been subjected to the DZ treatment processS313 is subjected to thermal treatment at 1000° C. for 16 hours, the BMD(oxygen precipitates) density is equal to or less than 1×10⁴ pcs/cm².

In the device manufacturing process S35 shown in FIG. 12, processesnecessary for forming devices based on the 45 nm node (hp65) on thesilicon wafer are performed. The device manufacturing process S35includes the rapid temperature-rising-and-falling thermal treatmentprocess S352 such as a spike-RTA process or an FLA process.

In the pre-photolithography process S351 and the post-photolithographyprocess S353 shown in FIG. 12, as shown in FIG. 5, a wafer 21 issupported and fixed onto a work stage 22 by vacuum suction, a photomask23 is supported and fixed onto a mask holder 24 above the work stage 22.Thereafter, the work stage 22 is lifted up to bring the thin wafer 21into close contact with the photomask 23, and then the wafer is exposed.A photoresist film (not shown) is formed on the surface of the wafer 21in advance and the photoresist film is exposed to bake a pattern of thephotomask 23.

In the method of manufacturing a silicon wafer according to the thirdembodiment, in the manufacturing condition setting process S30, thepulling conditions in the wafer preparing process S311, the treatmentconditions in the precipitation, dissolution, and thermal treatmentprocess S33, and the treatment conditions in the DZ treatment processS313 are determined in consideration of the conditions in the rapidtemperature-rising-and-falling thermal treatment process S352. Theprocesses are performed on the basis of the determined conditions.Therefore, in the silicon wafer according to the third embodiment,precipitates with a density and a size greater than 5×10⁴ pcs/cm² whichcauses the slip dislocation in the wafer are not formed. Accordingly, asshown in FIG. 5, even when the wafer 21 is supported and fixed onto thework stage 22 by vacuum suction, the maximum shift shown in FIG. 7 andresulting from the precipitates is not greater than 10 nm which is theallowable reference. That is, the deformation of a warp causing theoverlay error shown in FIG. 6 is not generated.

In addition, in the silicon wafer according to the third embodiment, itis possible to prevent the slip dislocation from being generated in theedge of the wafer W supported as shown in FIG. 8 and thus to prevent thestrength of the wafer from being lowered.

When the spike-RTA process is performed as the rapidtemperature-rising-and-falling thermal treatment process S352, theconditions can be set and the process can be performed by the use of theRTA apparatus 10 shown in FIG. 2.

Fourth Embodiment

Hereinafter, a silicon wafer and a manufacturing method thereofaccording to a fourth embodiment of the invention will be described withreference to the accompanying drawings.

FIG. 13 is a flowchart illustrating and a manufacturing method of asilicon wafer according to this embodiment.

The method of manufacturing a silicon wafer according to the fourthembodiment includes a manufacturing condition setting process S40, awafer preparing process S411, and a polishing process S412, as shown inFIG. 13. The silicon wafer manufactured by the method according to thefourth embodiment is provided to a device manufacturing process S45including a rapid temperature-rising-and-falling thermal treatmentprocess S452.

In the manufacturing condition setting process S40 shown in FIG. 13, thestandards of a wafer provided to the device manufacturing process S45and the conditions at the time of pulling a silicon single crystal froma silicon melt by the use of the CZ (Czochralski) method in the waferpreparing process S411 are set.

In the manufacturing condition setting process S40, the ratio of thepulling speed V and the temperature gradient G from the solid-liquidinterface serving as a parameter to be controlled at the time ofpulling, that is, the value of V/Q the oxygen concentration Oi of asilicon wafer (substrate), and the dopant concentrations are set asprocess requirements in the wafer preparing process S411.

In the wafer preparing process S411, a single crystal is pulled by theuse of the CZ method by the use of a CZ furnace, the pulled siliconsingle crystal ingot is sliced to form a wafer, and the wafer issubjected to surface treatment such as chamfering, grinding, andcleaning. Thereafter, the silicon wafer is provided to the polishingprocess S412 as a finishing process. The diameter of the silicon wafermay be in the range of 300 mm to 450 mm.

The CZ furnace shown in FIG. 11 in the second embodiment is used tomanufacture a silicon wafer in the wafer preparing process S411.

In the wafer preparing process S411, first, 100 kg of high-puritypolycrystalline silicon is input to the crucible 1 shown in FIG. 11 andnecessary dopants are also input thereto to adjust the dopantconcentrations in the polycrystalline silicon. Then, the inside of theCZ furnace is set to a hydrogen-containing atmosphere including mixedgas of a hydrogen-containing material and inert gas, the pressure of theatmosphere is set to be in the range of 1.3 to 13.3 kPa (10 to 100Torr), and the concentration of the hydrogen-containing material in theatmosphere gas is adjusted so that the partial pressure thereof in termsof hydrogen gas is in the range of 40 to 400 Pa. When hydrogen gas isselected as the hydrogen-containing material, the partial pressure ofthe hydrogen gas can be set to be in the range of 40 to 400 Pa. Theconcentration of the hydrogen gas is in the range of 0.3% to 31%.

The atmosphere may include only the inert gas not containing thehydrogen gas.

When the partial pressure of the hydrogen-containing material in termsof hydrogen gas is less than 40 Pa, the allowable range of the pullingspeed is reduced and thus the generation of COP defects and dislocationclusters cannot be suppressed, which is not preferable. As theconcentration of the hydrogen-containing material in terms of hydrogengas (the concentration of hydrogen) increases, the dislocationsuppressing effect increases. However, when the partial pressure interms of hydrogen gas is greater than 400 Pa, the possibility ofexplosion increases at the time of causing oxygen to leak into the CZfurnace, which is not preferable in terms of safety. The partialpressure of the hydrogen-containing material in terms of hydrogen gas ismore preferably in the range of 40 Pa to 250 Pa and still morepreferably in the range of 40 Pa to 135 Pa.

The horizontal magnetic field of, for example, 3000 G (0.3 T) issupplied from the magnetic field supply device 9 so that the magneticfield center height is in the range of −75 to +50 mm with respect to themelt surface, and the polycrystalline silicon is heated by the heater 2to form the silicon melt 3.

The seed crystal T mounted on the seed chuck 5 is immersed in thesilicon melt 3 and the crystal pulling is performed while rotating thecrucible 1 and the pulling shaft 4.

At this time, an example of the pulling condition is a condition thatwhen the growing speed of the single crystal is V (mm/min) and thetemperature gradient from the melting point to 1350° C. at the time ofgrowth of the single crystal is G (° C./mm), the ratio V/G (mm²/min° C.)is controlled to be in the range of 0.22 to 0.15 and V is controlled tobe in the range of 0.65 via 0.42 to 0.33 mm/min at which the siliconsingle crystal with grown-in defects free can be pulled.

Another example of the pulling condition is a condition that the numberof rotations of the quartz crucible is set to be in the range of 5 to0.2 rpm, the number of rotations of the single crystal is set to be inthe range of 20 to 10 rpm, the pressure of the argon atmosphere is setto 30 Torr, and the intensity of the magnetic field is set to 3000Gauss. Particularly, by setting the number of rotations of the quartzcrucible to 5 rpm or less, it is possible to prevent oxygen atomsincluded in the quartz crucible from diffusing into the silicon melt andto reduce the interstitial oxygen concentration in the silicon singlecrystal. Another example of the pulling condition is a condition thatthe number of rotations of the quartz crucible is set to 0.2 rpm orless, the number of rotations of the single crystal is set to 5 rpm orless, the pressure of the argon atmosphere is set to be in the range of1333 to 26660 Pa, and the intensity of the magnetic field is set to bein the range of 3000 to 5000 Gauss. The number of rotations of thesingle crystal may be set to 15 rpm or more.

The semiconductor device manufacturing process S45 is a subsequentprocess to which the silicon wafer prepared in the wafer preparingprocess S411 is provided. A stress is generated in the wafer dependingon the conditions in the rapid temperature-rising-and-falling thermaltreatment process S452 such as an FLA process of the semiconductordevice manufacturing process S45. There is an oxygen precipitation staterequired for coping with the stress. In the manufacturing conditionsetting process S40 shown in FIG. 13, the conditions in the waferpreparing process S411 are determined to set the oxygen precipitationstate to a desired state. In the device manufacturing process S45, thethermal treatment provided with the silicon wafer is the rapidtemperature-rising-and-falling thermal treatment process S452 in whichthe treatment time is set to be in the range of 1 μsec to 100 msec inthe highest temperature range of 1100° C. to the melting point ofsilicon. The conditions for suppressing the generation of a deformationand the generation of a slip in the wafer preparing process S411 (thepulling condition of the CZ method) are determined in the manufacturingcondition setting process S40 so that a pattern formed in apre-photolithography process S451 and a pattern formed in apost-photolithography process S453 before and after the rapidtemperature-rising-and-falling thermal treatment process S452 are notmisaligned to cause the overlay error.

The conditions in the manufacturing condition setting process S40 can beselected as follows.

In the manufacturing condition setting process S40, boron is doped sothat the resistivity is in the range of 0.001 Ωcm to 1 kΩcm and theinitial oxygen concentration Oi is set to be in the range of 12.0×10¹⁷to 14×10¹⁷ atoms/cm³ (Old-ASTM). At this time, the initial oxygenconcentration Oi is preferably set to be in the range of 12.3×10¹⁷ to13.8×10¹⁷ atoms/cm³.

In the device manufacturing process S45 shown in FIG. 13, processesnecessary for forming devices based on the 45 nm node (hp65) on thesilicon wafer are performed. The device manufacturing process S45includes the rapid temperature-rising-and-falling thermal treatmentprocess S452 such as a spike-RTA process or an FLA process.

In the pre-photolithography process S451 and the post-photolithographyprocess S453 shown in FIG. 13, as shown in FIG. 5, a wafer 21 issupported and fixed onto a work stage 22 by vacuum suction, a photomask23 is supported and fixed onto a mask holder 24 above the work stage 22.Thereafter, the work stage 22 is lifted up to bring the thin wafer 21into close contact with the photomask 23, and then the wafer is exposed.A photoresist film (not shown) is formed on the surface of the wafer 21in advance and the photoresist film is exposed to bake a pattern of thephotomask 23.

In the method of manufacturing a silicon wafer according to thisembodiment, in the manufacturing condition setting process S40, thepulling conditions in the wafer preparing process S411 are determined inconsideration of the conditions in the rapidtemperature-rising-and-falling thermal treatment process S452. Theprocesses are performed on the basis of the determined conditions.Therefore, the silicon wafer according to the fourth embodiment is awafer including the Pi region in which the oxygen precipitate density is1×10⁴ pcs/cm² or less after the thermal treatment at 800° C. for 4hours+1000° C. for 16 hours. That is, precipitates with a density and asize greater than 5×10⁴ pcs/cm² which causes the slip dislocation in thewafer are not formed. Accordingly, as shown in FIG. 5, even when thewafer 21 is supported and fixed onto the work stage 22 by vacuumsuction, the maximum shift shown in FIG. 7 and resulting from theprecipitates is not greater than 10 nm which is the allowable reference.That is, the deformation of a warp causing the overlay error shown inFIG. 6 is not generated.

In addition, in the silicon wafer according to the fourth embodiment, itis possible to prevent the slip dislocation from being generated in theedge of the wafer W supported as shown in FIG. 8 and thus to prevent thestrength of the wafer from being lowered.

When the spike-RTA process is performed as the rapidtemperature-rising-and-falling thermal treatment process S452, theconditions can be set and the process can be performed by the use of theRTA apparatus 10 shown in FIG. 2. The RTA apparatus 10 is the RTAapparatus 10 shown in FIG. 2 in the first embodiment.

In the first to fourth embodiments, as shown in FIG. 9, the frontsurface Wu of a wafer includes a main surface W23 which is a flatsurface and a front chamfered portion W24 formed in the edge portionthereof. The back surface Wr thereof includes a main surface W27 whichis a flat surface and a back chamfered portion W28 formed in the edgeportion thereof. The width A1 of the front chamfered portion W24 in thedirection from the edge Wut to the inside in the wafer radius directionis smaller than the width A2 of the back chamfered portion W28 in thedirection from the edge Wrt to the inside in the wafer radius direction.The width A1 of the front chamfered portion W24 is preferably in therange of 50 μm to 200 μm. The width A2 of the back chamfered portion W28is preferably in the range of 200 μm to 300 μm.

The front chamfered portion W24 has a first slope W11 tilted about themain surface W23 of the front surface Wu and the back chamfered portionW28 has a second slope W12 tilted about the main surface W27 of the backsurface Wr. The slope angle θ1 of the first slope W11 is preferably inthe range of 10° to 50°, the slope angle θ2 of the second slope W12 ispreferably in the range of 10° to 30°, and both angles preferablysatisfy θ1≦θ2.

A first curve W13 connecting the first slope W11 and the peripheral edgeWt is disposed in the front outermost edge Wut therebetween. A secondcurve W14 connecting the second slope W12 and the peripheral edge Wt isdisposed in the back outermost edge Wrt therebetween. The radius ofcurvature R1 of the first curve W13 is preferably in the range of 80 μmto 250 μm, and the radius of curvature R2 of the second curve W14 ispreferably in the range of 100 μm to 300 μm.

By constructing the end portions as described above, it is possible toreduce the generation of scratches at the time of handling the wafer. Inthe first to fourth embodiments of the invention, by setting theconditions of the wafer edge as well as the treatment conditions in therapid temperature-rising-and-falling thermal treatment process, it ispossible to further prevent the generation of a deformation in the rapidtemperature-rising-and-falling thermal treatment process of which theconditions are severe.

EXAMPLES

Hereinafter, examples of the invention will be described.

Experimental Example A

(100) wafers were prepared from a silicon single crystal ingot with adiameter of 300 mm, which was pulled by setting the boron concentration(resistivity), the initial oxygen concentration, the nitrogenconcentration, and the like as described in Tables 1 to 3, by theslicing and double-sided polishing (DSP) processes.

The conditions in the precipitation, dissolution, and thermal treatmentprocess S13 were set as described in Tables 1 to 3, the RTA process wasperformed on the prepared silicon wafers, and an epitaxial film with athickness of 4 μm was formed thereon through the epitaxial process at1150° C.

The thermal treatment in the device manufacturing process was simulatedwith the following conditions and the RTA thermal treatment as acompulsory thermal-stress test for generation of a deformation wasperformed on the wafers. The generation of slips due to the oxygenprecipitates (BMD) was checked by the use of X-ray topography.

<Simulation Conditions in Device Manufacturing Process>

First step: 850° C., 30 minutes

Second step: 1000° C., 30 minutes

Third step: 1000° C., 60 minutes

Fourth step: 850° C., 30 minutes

(The temperature rising and falling rate of each step is 5° C./min)

<Conditions of Thermal-stress Loading Test in RTA Furnace>

The temperature rising and falling rate from 700° C. was set to 150°C./sec, the highest temperature was set to 1250° C., and the retentiontime was set to 1 sec.

The results were shown as RTA furnace stress loading test results(generation of slips due to the BMD) in Tables 1 to 3.

Here, the BMD density was measured when the actualizing thermaltreatment at 1000° C. for 16 hours was first performed and the Wrightetching (of which the etching range is 2 μm) was then performed afterthe device simulation.

After the thermal treatment was performed by the use of a batch furnaceunder the following conditions as a stress loading test for thegeneration of scratches, the slip length was measured by the use ofX-ray topography. The results were shown as vertical furnace stressloading test results (slip due to boat scratches) in Tables 1 to 3.

<Vertical Furnace Thermal-stress Test Conditions>

The temperature rising and falling rate from 700° C. to 1150° C. was setto 8° C./min, the samples were retained at 1150° C. for 60 minutes, andthen the samples were cooled to 700° C. at a temperature falling rate of1.5° C./min.

TABLE 1 Vertical Initial RTA process BMD RTA furnace furnace oxygenTemperature- density stress loading stress loading concentration falling(/cm²) test result test result Resistivity (×E17 Temperature Time rateafter Epi (slips due (slips due (Ωcm) atoms/cc) (° C.) (sec) (° C./sec)Atmosphere growth to BMD) to boat) Sample A1 5 13.2 — — — — <1e4 ◯ XSample A2 0.018 12 — — — — 7.80E + 04 X (BMD) Δ Sample A3 0.018 14.8 — —— — 3.80E + 05 X (BMD) Δ Sample A4 0.004 14.5 — — — — 1.70E + 06 X (BMD)◯ Sample A5 0.018 10.5 — — — — <1e4 ◯ Δ Sample A6 0.003 9.5 — — — — <1e4◯ ◯ Sample A7 0.019 11.8 1150 10 10 100% Ar <1e4 ◯ Δ Sample A8 0.00515.1 1150 20 10 100% Ar <1e4 ◯ ◯ Sample A9 0.008 17.8 1200 10 10 100% Ar<1e4 ◯ ◯ Sample A10 0.005 17.1 1300 10 5 100% Ar <1e4 ◯ ◯ Sample A110.008 15.1 1125 20 10 100% Ar 4.60E + 05 X (BMD) ◯ Sample A12 0.004 14.51150 10 20 100% Ar 4.80E + 04 X (BMD) ◯

TABLE 2 Temperature- RTA Vertical falling furnace furnace Initial rate(° C./sec) BMD stress stress oxygen (cooling rate density loadingloading concentration Retention from highest (/cm²) test result testresult Resistivity (×E17 Temperature time temperature after Epi (slipsdue (slips due (Ωcm) atoms/cc) (° C.) (sec) to 700° C.) Atmospheregrowth to BMD) to boat) Sample 5 15.5 — — — — 4.50E + 04 X (BMD) ◯ A13Sample 4.7 15.5 1150 10 10 100% Ar <1e4 ◯ ◯ A14 Sample 4.2 18.5 1200 1010 100% Ar <1e4 ◯ ◯ A15 Sample 3.6 21.5 1300 5 10 100% Ar <1e4 ◯ ◯ A16Sample 3.7 22.4 1300 5 10 100% Ar 2.30E + 05 X (BMD) ◯ A17 Sample 3.618.5 1200 10 15 100% Ar 1.60E + 06 X (BMD) ◯ A18 Sample 3.2 17.5 1200 310 100% Ar 7.50E + 05 X (BMD) ◯ A19 Sample 3.5 17.1 1200 10 10 95%6.80E + 04 X (BMD) ◯ A20 Ar + 5% N₂ Sample 20.5 15.3 1200 10 10 97% <1e4◯ ◯ A21 Ar + 3% O₂ Sample 20.1 15.5 1200 10 25 97% <1e4 ◯ ◯ A22 Ar + 3%O₂ Sample 18.5 14.3 1200 10 50 90% <1e4 ◯ ◯ A23 Ar + 3% O₂ Sample 18.314.7 120 10 75 90% 4.30E + 04 X (BMD) ◯ A24  Ar + 10% O₂

TABLE 3 Nitrogen-doped Epi Initial Vertical oxygen Nitrogen Temper- RTAfurnace furnace concen- concen- ature- BMD stress loading stress trationtration Temper- falling density test result loading test Resistivity(×E17 (×E13 ature Time rate (/cm²) after (slips due result (slips (Ωcm)atoms/cc) atoms/cc) (° C.) (sec) (° C./sec) Atmosphere Epi growth toBMD) due to boat) Sample 5 12.5 2.30 — — — — 7.50E + 04 X (BMD) ◯ A25Sample 4.3 12.6 5.60 1150 10 10 100% Ar 3.50E + 04 X (BMD) ◯ A26 Sample3.5 11.6 3.50 1200 10 10 100% Ar <1e4 ◯ ◯ A27 Sample 3.8 14.1 8.60 12005 10 100% Ar <1e4 ◯ ◯ A28 Sample 4.6 14.5 33.00 1200 10 10 100% Ar <1e4◯ ◯ A29 Sample 3.6 13.7 42.50 1300 5 10 100% Ar <1e4 ◯ ◯ A30

Here, the results of the slips or the slip lengths measured by the useof X-ray topography were defined as follows.

The RTA furnace thermal-stress loading test results were evaluated asfollows.

O (A: Good): The generation of minute slips could not be confirmed bythe use of X-ray topography.

X (B: Not Acceptable): The generation of minute slips could be confirmedby the use of X-ray topography.

Since the RTA process was performed for a short time, the slip lengthwas minute and it was thus difficult to measure the slip length.

On the other hand, in the vertical furnace thermal-stress loading test,the lengths of slips extending from boat scratches were measured andwere evaluated as follows.

O: slip length of 0.5 to 2 mm (A: Good)

Δ: slip length of 2 to 5 mm (B: Acceptable)

X: slip length of 5 to 10 mm (C: Not Acceptable)

In the BMD density (pcs/cm²) after the epitaxial growth, <1e4 meant thatit was equal to or less than an actual detection limit.

In Sample A1, since the formation of oxygen precipitation nuclei waskept at a low level even after the epitaxial growth, precipitates werenot formed in the Epi growth+precipitation processes. Accordingly, therewas no slip due to the BMD. However, since the oxygen concentration waslow in the vertical furnace test, slips due to boat scratches extend,which is evaluated as NG.

In Sample A2, since the oxygen concentration was low but the boronconcentration was high, precipitation nuclei were formed in the thermaltreatment after the Epi. Since the boron concentration was high, thegeneration of slips due to boat scratches was suppressed but slips dueto the BMD were generated, which is evaluated as NG.

In Sample A3, since the oxygen concentration was high and the boronconcentration was high, slips due to BMD were generated and thegeneration of slips due to boat scratches was suppressed, which isevaluated as NG.

In Sample A4, since the oxygen concentration was high and the boronconcentration was high, slips due to BMD were generated and thegeneration of slips due to boat scratches was much suppressed, which isevaluated as NG.

In Sample A5, the precipitation after the Epi was suppressed due to thelow oxygen concentration. The generation of slips in the verticalfurnace was suppressed due to the effect of boron, which is evaluated asOK.

In Sample A6, the precipitation after the Epi was suppressed due to thelow oxygen concentration. The generation of slips in the verticalfurnace was suppressed due to the effect of the high-concentrationboron, which is evaluated as OK.

In Sample A7, the formation of BMD in the RTA process was suppressed,which is evaluated as OK.

In Sample A8, the formation of BMD in the RTA process was suppressed,which is evaluated as OK.

In Sample A9, the formation of BMD in the RTA process was suppressed,which is evaluated as OK.

In Sample A10, the formation of BMD in the RTA process was suppressed,which is evaluated as OK.

In Sample A11, the RTA temperature was equal to or less than 1150° C.and slips due to BMD were generated, which is evaluated as NG.

In Sample A12, vacancies were frozen by the rapid cooling in the RTAprocess to form BMD and slips due to BMD were generated, which isevaluated as NG.

In Sample A13, since the oxygen concentration was high and oxygenprecipitation nuclei were easily formed even after the Epi growth, slipsdue to BMD were generated. Since the oxygen concentration was high,slips due to boat scratches were suppressed, which is evaluated as NG.

In Sample A14, since no BMD was present and the substrate had a highoxygen concentration, slips due to boat scratches were not present,which is evaluated as OK.

In Sample A15, since no BMD was present and the substrate had a highoxygen concentration, slips due to boat scratches were not present,which is evaluated as OK.

In Sample A16, since no BMD was present and the substrate had a highoxygen concentration, slips due to boat scratches were not present,which is evaluated as OK.

In Sample A17, since the oxygen concentration was high, the formation ofBMD was promoted even after the RTA process and slips due to BMD weregenerated, which is evaluated as NG.

In Sample A18, since the cooling rate was excessively high and vacancieswere frozen, slips due to BMD were generated, which is evaluated as NG.

In Sample A19, since the RTA process time was insufficient, slips due toBMD were generated from BMD nuclei, which is evaluated as NG.

In Sample A20, since vacancies were injected due to the formation of anitride film out of nitrogen and oxygen precipitates were formed, slipsdue to BMD were generated, which is evaluated as NG.

In Sample A21, since no BMD was present and the substrate had a highoxygen concentration, slips due to boat scratches were not present,which is evaluated as OK.

In Sample A22, interstitial Si was injected due to the formation of anoxide film in the RTA process and vacancies were not frozen even by thecooling at 10° C./sec or higher, which is evaluated as OK.

In Sample A23, interstitial Si was injected due to the formation of anoxide film in the RTA process and vacancies were not frozen even by thecooling at 10° C./sec or higher, which is evaluated as OK.

In Sample A24, since an oxide film was formed but the cooling rate wasexcessively high and vacancies were frozen, slips due to BMD weregenerated, which is evaluated as NG.

In Sample A25, BMD was formed by the nitrogen-doping effect, which isevaluated as NG.

In Sample A26, since BMD in a nitrogen-doped epitaxial wafer wasstabilized at a high temperature, the BMD was not eliminated in the RTAat 1150° C., which is evaluated as NG.

In Samples A27 to A30, BMD was eliminated by the doping with nitrogenregardless of the concentration. Since the substrate had a high oxygenconcentration, slips due to boat scratches were not present, which isevaluated as OK.

It can be seen from these results that it is possible to prevent thedeformation and the slip extension by setting the oxygen concentration,the boron concentration, and the conditions in the RTA process.

Experimental Example B

(100) wafers were prepared from a silicon single crystal ingot with adiameter of 300 mm, which was pulled by setting the boron concentration(resistivity) to 10 Ωcm and setting the initial oxygen concentration,the nitrogen concentration and the like as described in Table 4, by theslicing and double-sided polishing (DSP) processes. At this time, thedistribution of the Pi and Pv regions and the values of V/G were shownin the table.

The conditions in the precipitation, dissolution, and thermal treatmentprocess S23 were set as described in Table 4, the RTA process wasperformed on the prepared silicon wafers.

The thermal treatment in the device manufacturing process was simulatedwith the following conditions and the RTA thermal treatment as acompulsory thermal-stress test for generation of a deformation wasperformed on the wafers. The generation of slips due to the oxygenprecipitates (BMD) was checked by the use of X-ray topography.

<Simulation Conditions in Device Manufacturing Process>

First step: 850° C., 30 minutes

Second step: 1000° C., 30 minutes

Third step: 1000° C., 60 minutes

Fourth step: 850° C., 30 minutes

(The temperature rising and falling rate of each step is 5° C./min)

The results were shown as RTA furnace stress loading test results(generation of slips due to the BMD) in Table 4.

Here, the BMD density was measured when the actualizing thermaltreatment at 1000° C. for 16 hours was first performed and the Wrightetching (of which the etching range is 2 μm) was then performed afterthe device simulation.

After the thermal treatment was performed by the use of a batch furnaceunder the following conditions as a stress loading test for thegeneration of scratches, the slip length was measured by the use ofX-ray topography. The results were shown as vertical furnace stressloading test results (slip due to boat scratches) in Table 4.

<Vertical Furnace Thermal-Stress Test Conditions>

The temperature rising and falling rate from 700° C. to 1150° C. was setto 8° C./min, the samples were retained at 1150° C. for 60 minutes, andthen the samples were cooled to 700° C. at a temperature falling rate of1.5° C./min.

TABLE 4 After thermal simulation of device Initial RTA Vertical oxygenfurnace stress furnace concen- RTA condition loading stress trationTemper- Cooling test result loading test (×E17 In-plane V/G value ofature Time rate (slips due result (slips atoms/cc) wafer defect region(° C.) (sec) atmosphere (° C./sec) to BMD) due to boat) Sample B1 12.4Pv + Pi (0.21~0.15) — — — — X ◯ Sample B2 12.2 Pi (0.18~0.15) — — — — ◯◯ Sample B3 13.8 Pi (0.18~0.15) — — — — ◯ ◯ Sample B4 14.2 Pi(0.18~0.15) — — — — X ◯ Sample B5 12.2 Pv + Pi (0.21~0.15) 950 10 100%Ar 5 ◯ ◯ Sample B6 13 Pv + Pi (0.21~0.15) 1150 5 100% Ar 10 ◯ ◯ SampleB7 13.6 Pv + Pi (0.21~0.15) 1150 5 100% Ar + 5% O₂ 10 ◯ ◯ Sample B8 18.5Pv + Pi (0.21~0.15) 1200 5 100% Ar 10 ◯ © Sample B9 13.4 Pv + Pi(0.21~0.15) 1200 5  95% + N₂ 10 XX ◯ Sample B10 12.3 Pv + Pi (0.21~0.15)1200 5 100% Ar 5 X ◯ Sample B11 10.5 OSF + Pv (0.22~0.20) — — — — XX XSample B12 13.2 OSF + Pv + P (0.21~0.18) — — — — XX ◯ Sample B13 13.1OSF + Pv + Pi (0.21~0.18) 1200 5 100% Ar 10 X ◯ Sample B14 13.2 OSF +Pv + Pi (0.21~0.18) 1225 5 100% Ar 10 ◯ ◯ Sample B15 12.8 OSF + Pv(0.22~0.20) 1300 5 100% Ar 10 ◯ ◯ Sample B16 12.1 OSF + Pv (0.22~0.20)1300 5 100% Ar + 5% O₂ 5 ◯ ◯

Here, the results of the generation of slips or the slip lengthsmeasured by the use of X-ray topography were defined as follows.

©: slip length of 0 to 0.5 mm (S: Very Good)

O: slip length of 0.5 to 2 mm (A: Good)

Δ: slip length of 2 to 5 mm (B: Acceptable)

X: slip length of 5 to 10 mm (C: Not Acceptable)

XX: slip length of 10 to 15 mm (D: Poor)

The defect regions (Pv, Pi, and the like) shown in the table mean thedefective regions included in the plane of a wafer. For example, whenall of the OSF region, the Pv region, and the Pi region are included inthe plane of a wafer, the value of G varies in the wafer diameterdirection and the value of V/G varies in the plane. Accordingly, thevalue of V/G of each wafer has a range. Therefore, it is described inthe table that the value of V/G has a range.

In Sample B1, slips were generated from oxygen precipitates in the Pvregion, which is evaluated as NG.

In Samples B2 and B3, the vacancy-dominant region is not included in theouter peripheral portion and slips due to BMD were not generated, whichis evaluated as OK.

In Sample B4, since the Pi region has a high oxygen concentration,oxygen precipitates were formed, which is evaluated as NG.

In Samples B5, B6, and B7, precipitation nuclei in the Pv region wereeliminated by the RTA process, which is evaluated as OK.

In Sample B8, precipitation nuclei in the Pv region were eliminated bythe RTA process and the generation of slips due to boat was muchsuppressed, which is evaluated as OK.

In Sample B9, a nitride film was formed in the atmosphere of N₂ andvacancies were injected to enhance the precipitation, which is evaluatedas NG.

In Sample B10, vacancies were frozen by the rapid cooling to enhance theprecipitation, which is evaluated as NG.

In Sample B11, slips were generated due to the precipitation in the OSFregion and the Pv region. Since the oxygen concentration was low, slipsdue to boat scratches were generated, which is evaluated as NG.

In Sample B12, slips were generated due to the precipitation in the OSFregion and the Pv region, which is evaluated as NG.

In Sample B13, nuclei in the OSF region were not eliminated by the RTAprocess, which is evaluated as NG.

In Samples B14, B15, and B16, nuclei in the OSF region were eliminatedby the RTA process, which is evaluated as OK.

Experimental Example C

(100) wafers were prepared from a silicon single crystal ingot with adiameter of 300 mm having the V region including void defects, which waspulled by setting the boron concentration and the initial oxygenconcentration as described in Table 5, by the slicing and double-sidedpolishing (DSP) processes.

The conditions in the precipitation, dissolution, and thermal treatmentprocess S33 were set as described as the RTA conditions in Table 5, theRTA process was performed on the prepared silicon wafers, and theannealing process at 1000° C. for 16 hours in a batch furnace wasperformed as the DZ process.

The thermal treatment in the device manufacturing process was simulatedwith the following conditions and the RTA thermal treatment as acompulsory thermal-stress test for generation of a deformation wasperformed on the wafers. The generation of slips due to the oxygenprecipitates (BMD) was checked by the use of X-ray topography.

<Simulation Conditions in Device Manufacturing Process>

First step: 850° C., 30 minutes

Second step: 1000° C., 30 minutes

Third step: 1000° C., 60 minutes

Fourth step: 850° C., 30 minutes

(The temperature rising and falling rate of each step is 5° C./min)

The results were shown as RTA furnace stress loading test results(generation of slips due to the BMD) in Table 5.

Here, the BMD density was measured when the actualizing thermaltreatment at 1000° C. for 16 hours was first performed and the Wrightetching (of which the etching range is 2 μm) was then performed afterthe device simulation.

After the thermal treatment was performed by the use of a batch furnaceunder the following conditions as a stress loading test for thegeneration of scratches, the slip length was measured by the use ofX-ray topography. The results were shown as vertical furnace stressloading test results (slip due to boat scratches) in Table 5.

<Vertical Furnace Thermal-stress Test Conditions>

The temperature rising and falling rate from 700° C. to 1150° C. was setto 8° C./min, the samples were retained at 1150° C. for 60 minutes, andthen the samples were cooled to 700° C. at a temperature falling rate of1.5° C./min.

TABLE 5 RTA Vertical furnace furnace Initial stress stress oxygen LPD DZLPD RTA condition BMD loading loading concen- Doped density temper-density Cool- density test test tration nitrogen before ature after DZing after result result (×E17 concen- process (° C.)/ process Temper-rate 1000° C./ (slips (slips atoms/ tration (pcs/ time (pcs/ ature Time(° C./ 16 hr due to due to cc) (pcs/cm² ) cm²) (min) cm²) (° C.) (sec)atmosphere sec) (/cm²) BMD) boat) Sample C1 8.5 Not doped 42.8 1200/600.014 — — — — <1.0E4 ◯ X Sample C2 13.5 Not doped 58.5 1200/60 0.016 — —— — 2.60E + 05 X ◯ Sample C3 12.3 Not doped 10.2 1200/60 0.011 950 10100% Ar 10 <1.0E4 ◯ ◯ Sample C4 13.8 Not doped 38.3 1200/60 0.013 115010 100% Ar 10 <1.0E4 ◯ ◯ Sample C5 16.7 Not doped 2.5 1200/60 0.026 120010 100% Ar 10 <1.0E4 ◯ ◯ Sample C6 17.7 Not doped 8.9  1150/180 0.0341200 5 99% Ar + 1% O₂   10 <1.0E4 ◯ ◯ Sample C7 17.5 Not doped 10.61200/60 0.022 1200 5 95% + 5% O₂ 5 <1.0E4 ◯ ◯ Sample C8 15.3 Not doped35.3 1200/60 0.021 1150 10 90% Ar + 10% N₂  10 4.50E + 04 X ◯ Sample C914.2 Not doped 34.2 1200/60 0.026 1150 10 100% Ar 15 6.70E + 04 X ◯Sample C10 13.8 1.20E + 13 28.5 1200/60 0.011 1200 5 95% + 5% O₂ 10<1.0E4 ◯ ◯ Sample C11 13.7 6.30E + 13 63.6  1150/180 0.016 1200 5 95% +5% O₂ 5 <1.0E4 ◯ ◯ Sample C12 13.1 5.40E + 14 5.3 1200/60 0.014 1200 595% + 5% O₂ 10 <1.0E4 ◯ ◯ Sample C13 14.6 4.80E + 14 7.4 1200/60 0.0221325 5 95% + 5% O₂ 10 <1.0E4 ◯ ◯ Sample C14 13.5 4.00E + 13 35.6 1200/600.030 1150 10 95% + 5% O₂ 10 2.30E + 05 X ◯

Here, the results of the generation of slips or the slip lengthsmeasured by the use of X-ray topography were defined as follows.

O: slip length of 0.5 to 2 mm (A: Good)

Δ: slip length of 2 to 5 mm (B: Acceptable)

X: slip length of 5 to 10 mm (C: Not Acceptable)

In Sample C1, the formation of BMD in the high-temperature annealingprocess was suppressed due to the use of a low-oxygen substrate andslips due to BMD were not generated in the RTA process after theannealing process. However, since the substrate had a low oxygenconcentration, slips were generated in the vertical furnace stressloading test after the annealing process, which is evaluated as NG.

In Sample C2, BMD was formed in the high-temperature annealing processand slips were generated in the RTA process. The oxygen concentrationwas high and the formation of slips due to boat scratches in thevertical furnace was suppressed, which is evaluated as NG.

In Sample C3, the oxygen precipitation nuclei formed at the time ofpulling a crystal were dissolved in the RTA process. BMD was notre-formed in the subsequent annealing process, which is evaluated as OK.

In Samples C4, C5, C6, and C7, the same is true, which is evaluated asOK.

In Sample C8, vacancies were injected by the formation of a nitride filmin the RTA process and the precipitation nuclei were stabilized, whichis evaluated as NG.

In Sample C9, vacancies were frozen by the rapid cooling in the RTAprocess and precipitation nuclei were stabilized. BMD grew in thehigh-temperature annealing process, which is evaluated as NG.

In Samples C10, C11, C12, and C13, vacancies were frozen by the rapidcooling to enhance the precipitation, which is evaluated as NG.

In Sample C14, the oxygen precipitation nuclei formed at the time ofpulling the crystal were stabilized in the N-doped wafer and the highesttemperature in the RTA process was low. Accordingly, the oxygenprecipitation nuclei were not eliminated and the BMD grew in theannealing process, which is evaluated as NG.

Experimental Example D

(100) wafers were prepared from a silicon single crystal ingot with adiameter of 300 mm, which was pulled by setting the boron concentration(resistivity) to 12 Ωcm and setting the initial oxygen concentration asdescribed in Table 6, by the slicing and double-sided polishing (DSP)processes.

The thermal treatment in the device manufacturing process was simulatedwith the following conditions and the RTA thermal treatment as acompulsory thermal-stress test for generation of a deformation wasperformed on the wafers. The generation of slips due to the oxygenprecipitates (BMD) was checked by the use of X-ray topography.

<Simulation Conditions in Device Manufacturing Process>

First step: 850° C., 30 minutes

Second step: 1000° C., 30 minutes

Third step: 1000° C., 60 minutes

Fourth step: 850° C., 30 minutes

(The temperature rising and falling rate of each step is 5° C./min)

The results were shown as RTA furnace stress loading test results(generation of slips due to the BMD) in Table 6.

Here, the BMD density was measured when the actualizing thermaltreatment at 1000° C. for 16 hours was first performed and the Wrightetching (of which the etching range is 2 μm) was then performed afterthe device simulation.

After the thermal treatment was performed by the use of a batch furnaceunder the following conditions as a stress loading test for thegeneration of scratches, the slip length was measured by the use ofX-ray topography. The results were shown as vertical furnace stressloading test results (slip due to boat scratches) in Table 6.

<Vertical Furnace Thermal-stress Test Conditions>

The temperature rising and falling rate from 700° C. to 1150° C. was setto 8° C./min, the samples were retained at 1150° C. for 60 minutes, andthen the samples were cooled to 700° C. at a temperature falling rate of1.5° C./min.

TABLE 6 Pv region is not included in outer edge, oxygen BMD densityconcentration within 20 mm After thermal simulation of device is definedfrom outer RTA furnace Vertical furnace Initial oxygen edge after stressloading stress loading concentration Defect region precipitation testresult (slips test result (slips (×E17 atoms/cc) (V/G value) process(/cm²) due to BMD) due to boat) Sample D1 10.1 Pv region is 5.20E + 04 XX present (0.22) Sample D2 13.5 Pv region is 6.50E + 05 X ◯ present(0.21) Sample D3 12.3 Pi region (0.18) <1e4 ◯ ◯ Sample D4 13.8 Pi region(0.19) <1e4 ◯ ◯

Here, the results of the generation of slips or the slip lengthsmeasured by the use of X-ray topography were defined as follows.

O: slip length of 0.5 to 2 mm (A: Good)

Δ: slip length of 2 to 5 mm (B: Acceptable)

X: slip length of 5 to 10 mm (C: Not Acceptable)

In the BMD density (pcs/cm²) after the precipitation process within 20mm from the outer peripheral edge in the polished wafers, <1e4 meantthat it was equal to or less than an actual detection limit.

In Sample D1, the thermal stress in the outer peripheral edge was greatin the RTA furnace and slips due to BMD were generated. The oxygenconcentration was low in the vertical furnace and slips were generatedfrom boat scratches, which is evaluated as NG.

In Sample D2, the oxygen concentration was high, the generation of slipsdue to boat scratches was suppressed, and slips due to BMD weregenerated, which is evaluated as NG.

In Samples D3 and D4, the vacancy-dominant region was not included inthe outer peripheral edge and slips due to BMD were not generated, whichis evaluated as OK.

REFERENCE SIGNS LIST

-   -   W: SILICON WAFER

The invention claimed is:
 1. A method of manufacturing a siliconepitaxial wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature ranges from 1050° C. to the melting point of siliconand of which the temperature rising and falling rate ranges from 150°C./sec to 10000° C./sec, the method comprising: an epitaxial process ofcausing an epitaxial layer to grow on the surface of a substrate, whichis doped with boron so as to have resistivity of 0.02 Ωcm to 1 kΩcm andof which the initial oxygen concentration Oi is in the range of14.0×10¹⁷ to 22×10¹⁷ atoms/cm³ ASTM F 121, 1970-1979 published byAmerican Society for Testing and Materials International); and an oxygenprecipitation nuclei dissolution process of treating a wafer in thetreatment temperature range of 1150° C. to 1300° C., the retention timerange of 5 sec to 1 min, and the temperature-falling rate range of 10°C./sec to 0.1° C./sec, wherein the oxygen precipitation nucleidissolution process is performed before or after the epitaxial process,the thermal treatment process is applied to only an outermost surfacelayer of the silicon epitaxial wafer, the oxygen precipitates density isequal to or less than 5×10⁴ pcs/cm² in the silicon epitaxial wafer, andthe wafer includes a front surface and back surface, both having a flatmain surface, a front sloped chamfered portion having an angle θ1, whichis in a range of from 10° to 50°, a back sloped chamfered portion havingan angle θ2, which is in a range of from 10° to 30°, and front and backcurved portions, which connect the front and back chamfered portions toa peripheral edge of the wafer.
 2. A method of manufacturing a siliconepitaxial wafer which is provided to a semiconductor devicemanufacturing process having a thermal treatment process of which thehighest temperature ranges from 1050° C. to the melting point of siliconand of which the temperature rising and falling rate ranges from 150°C./sec to 10000° C./sec, the method comprising: an epitaxial process ofcausing an epitaxial layer to grow on the surface of a substrate, whichis doped with nitrogen of 1×10¹³ to 5×10¹⁴ atoms/cm³; and an oxygenprecipitation nuclei dissolution process of treating a wafer in thetreatment temperature range of 1200° C. to 1300° C., the retention timerange of 5 sec to 1 min, and the temperature-falling rate range of 10°C./sec to 0.1° C./sec after the epitaxial process, wherein the thermaltreatment process is applied to only an outermost surface layer of thesilicon epitaxial wafer, the oxygen precipitates density is equal to orless than 5×10⁴ pcs/cm² in the silicon epitaxial wafer, and the waferincludes a front surface and back surface, both having a flat mainsurface, a front sloped chamfered portion having an angle θ1, which isin a range of from 10° to 50°, a back sloped chamfered portion having anangle θ2, which is in a range of from 10° to 30°, and front and backcurved portions, which connect the front and back chamfered portions toa peripheral edge of the wafer.
 3. The method of manufacturing a siliconepitaxial wafer according to claim 1, wherein the treatment atmospherein the oxygen precipitation nuclei dissolution process is set to anatmosphere of non-oxidizing gas not containing nitrogen.
 4. The methodof manufacturing a silicon epitaxial wafer according to claim 1, whereinthe treatment atmosphere in the oxygen precipitation nuclei dissolutionprocess is set to a mixed atmosphere of non-oxidizing gas not containing1% or more of nitrogen and oxygen gas.
 5. A silicon epitaxial wafermanufactured by the method of manufacturing a silicon epitaxial waferaccording to claim
 1. 6. The method of manufacturing a silicon epitaxialwafer according to claim 2, wherein the treatment atmosphere in theoxygen precipitation nuclei dissolution process is an atmosphere of anon-oxidizing gas not containing nitrogen.
 7. The method ofmanufacturing a silicon epitaxial wafer according to claim 2, whereinthe treatment atmosphere in the oxygen precipitation nuclei dissolutionprocess is a mixed atmosphere of a non-oxidizing gas not containing 1%or more of nitrogen and oxygen gas.
 8. A silicon epitaxial wafermanufactured by the method of manufacturing the silicon epitaxial waferaccording to claim 2.